1.

Conference Proceedings
Conference Proceedings
1. Processing of Closed-Cell Magnesium Foams
K. Kitazono ; Y. Kikuchi ; E. Sato ; K. Kuribayashi
Pub. info.: THERMEC 2006 : supplement to THERMEC 2006, 5th International conference on processing and manufacturing of advanced materials, July 4-8, 2006, Vancouver, Canada.  539-543  pp.1839-1844,  2007.  Stafa-Zuerich.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 539-543(2)
2.

Conference Proceedings
Conference Proceedings
2. Quality control of embedded-type phase-shift mask
Y. Yamada ; K. Chiba ; E. Karikawa ; H. Unno ; Y. Kikuchi
Pub. info.: Photomask and X-ray mask technology II : 20-21 April 1995, Kawasaki City, Kanagawa, Japan.  pp.356-357,  1995.  Bellingham, WA.  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2512
3.

Conference Proceedings
Conference Proceedings
3. Development of qualitative near infrared vascular imaging system with tuned aperture computed tomography
T. Matsushita ; T. Miyati ; K. Nakayama ; T. Hamaguti ; Y. Hayakawa ; A. G. Farman ; Y. Kikuchi
Pub. info.: Medical Imaging 2007: Physics of Medical Imaging.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6510
4.

Conference Proceedings
Conference Proceedings
4. Fidelity of rectangular patterns printed with 0.3-NA MET optics
Y. Tanaka ; Y. Kikuchi ; D. Goo ; I. Nishiyama
Pub. info.: Emerging lithographic technologies XI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6517
5.

Conference Proceedings
Conference Proceedings
5. Pellicle factors affecting finished photomask flatness
K. Racette ; A. Watts ; M. Barrett ; R. Nolan ; Y. Sasaki ; Y. Kikuchi ; T. Matsumura
Pub. info.: Photomask and next-generation lithography mask technology XIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6607
6.

Conference Proceedings
Conference Proceedings
6. Impact of transmitted and reflected light inspection on mask inspectability, defect sensitivity, and mask design rule restrictions
Y. Kodera ; K. Badger ; E. Gallagher ; S. Akima ; M. Lawliss ; H. Ikeda ; I. Stobert ; Y. Kikuchi
Pub. info.: Photomask and next-generation lithography mask technology XIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6607
7.

Conference Proceedings
Conference Proceedings
7. Resist evaluation for EUV application at ASET
D. Goo ; Y. Tanaka ; Y. Kikuchi ; H. Oizumi ; I. Nishiyama
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519
8.

Conference Proceedings
Conference Proceedings
8. Evaluation of TIBr detectors with Tl electrodes
K. Hitomi ; Y. Kikuchi ; T. Shoji ; K. Ishii
Pub. info.: Hard X-ray, gamma-ray, and neutron detector physics X : 11-13 August 2008, San Diego, California, USA.  pp.70790J-1-70790J-7,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7079