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13 results

Conference Proceedings

1. Alternating phase-shift mask and binary mask for 45-nm node and beyond: the impact on the mask error control

Y. Kojima ; M. Shirasaki ; K. Chiba ; T. Tanaka ; Y. Inazuki ; H. Yoshikawa ; S. Okazaki ; K. Iwase ; K. Ishikawa ; K. Ozawa

Pub. info.:	Photomask and next-generation lithography mask technology XIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6607

Conference Proceedings

2. Analysis of diffraction orders including mask topography effects for OPC optimization

Y. Inazuki ; N. Toyama ; T. Adachi ; T. Nagai ; T. Suto ; Y. Morikawa ; H. Mohri ; N. Hayashi

Pub. info.:	Optical microlithography XX. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6520

Conference Proceedings

3. Pupil plane analysis on AIMS 45-193i for advanced photomasks

Y. Morikawa ; T. Sutou ; K. Mesuda ; T. Nagai ; Y. Inazuki ; T. Adachi ; N. Toyama ; H. Mohri ; N. Hayashi ; U. Stroessner ; R. Birkner ; R. Richter ; T. Scheruebl

Pub. info.:	Optical microlithography XX. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6520

Conference Proceedings

4. Extendibility of single mask exposure for practical ArF immersion lithography

T. Adachi ; Y. Inazuki ; T. Sutou ; T. Nagai ; N. Toyama ; Y. Morikawa ; H. Mohri ; N. Hayashi

Pub. info.:	Photomask and next-generation lithography mask technology XIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6607

Conference Proceedings

5. Approach to analyze decomposition impact for photomask fabrication

N. Toyama ; T. Adachi ; Y. Inazuki ; T. Sutou ; T. Nagai ; Y. Morikawa ; H. Mohri ; N. Hayashi

Pub. info.:	Photomask and next-generation lithography mask technology XIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6607

Conference Proceedings

6. Characteristics optimization of mask materials for hyper-NA lithography

Y. Morikawa ; T. Suto ; T. Nagai ; Y. Inazuki ; T. Adachi ; Y. Kitahata ; T. Yokoyama ; N. Toyama ; H. Mohri ; N. Hayashi

Pub. info.:	EMLC 2007 : 23rd european mask and lithography conference : 22-25 January 2007, Grenoble, France. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6533

Conference Proceedings

7. Mask CD compensation method using diffraction intensity for lithography equivalent metrology

T. Nagai ; T. Sutou ; Y. Inazuki ; H. Hashimoto ; N. Toyama

Pub. info.:	Photomask and next-generation lithography mask technology XV. 1 pp.70281M-1-70281M-10, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	7028

Conference Proceedings

8. Development status of back-end process for UV-NIL template fabrication

Y. Inazuki ; K. Itoh ; S. Hatakeyama ; K. Kojima ; M. Kurihara

Pub. info.:	Photomask technology 2008. 2 pp.71223Q-1-71223Q-8, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	7122

Conference Proceedings

9. DPL performance analysis strategy with conventional workflow

N. Toyama ; Y. Inazuki ; T. Sutou ; T. Nagai ; Y. Morikawa

Pub. info.:	Photomask technology 2007. 1 pp.67301I-1-67301I-10, 2007. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6730

10.

Conference Proceedings

10. Estimating DPL photomask fabrication load compared with single exposure

N. Toyama ; Y. Inazuki ; T. Sutou ; T. Nagai ; Y. Morikawa

Pub. info.:	Photomask technology 2007. 1 pp.67301J-1-67301J-10, 2007. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6730

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Author: Y. Inazuki