1.

Conference Proceedings
Conference Proceedings
1. Anti-bubble topcoat for immersion lithography
Paulsson, A. ; Xing, K. ; Fosshaug, H. ; Lundvall, A. ; Bjornberg, C. ; Karlsson, J.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.527-536,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
2.

Technical Paper
Technical Paper
2. Modeling and Dynamic Analysis of Paralleled dc/dc Converters With Master-Slave Current Sharing Control
Rajagopalan, J. ; Xing, K. ; Guo, Y. ; Lee, F. C. ; Manners, Bruce
Pub. info.: NASA Technical Reports.  19960017264  (NASA-TM-107186),  pp.1-14,  1996.  National Aeronautics and Space Adminstration
3.

Technical Paper
Technical Paper
3. Modeling and Dynamic Analysis of Paralleled of dc/dc Converters with Master-Slave Current Sharing Control
Rajagopalan, J. ; Xing, K. ; Guo, Y. ; Lee, F. C. ; Manners, Bruce
Pub. info.: NASA Technical Reports.  19970022703  (NASA-CR-204914),  pp.1-9,  1996.  National Aeronautics and Space Adminstration
4.

Conference Proceedings
Conference Proceedings
4. FEP-171 resist thickness optimization and dry etch screening on NTAR7 chrome substrates for Sigma7300 DUV laser pattern generator
Karlsson, J. O. ; Xing, K. ; Bajramovic, A. ; Dahlberg, H. ; Bjornberg, C. ; Hogfeldt, P. ; Kjellberg, L. ; Fosshaug, H. ; Dahlberg, A. ; Lundvall, A.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.234-244,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
5.

Conference Proceedings
Conference Proceedings
5. High performance FEP-171 resist process in combination with NTAR7 and NTAR5 chrome and the Sigma7300 DUV mask writer [5853-04]
Xing, K. ; Karlsson, J. ; Paulson, A. ; Bjornberg, C. ; Lundvall, A. ; Hogfeldt, P. ; Vedenpaa, J. ; Goodoree, R. ; Bjuggren, M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.31-41,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
6.

Conference Proceedings
Conference Proceedings
6. Resist process optimization for a DUV laser pattern generator
Fosshaug, H.A. ; Bajramovic, A. ; Karlsson, J. ; Xing, K. ; Rosendahl, A. ; Dahlberg, A. ; Bjoernberg, C. ; Bjuggren, M. ; Sandstrom, T.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.355-365,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
7.

Conference Proceedings
Conference Proceedings
7. Influence of writing strategy on CD control for the spatial-light-modulator-based Sigma7300 DUV laser pattern generator
Fosshaug, H. ; Askebjer, P. ; Karlsson, J. ; Bajramovic, A. ; Xing, K. ; Eklund, R. ; Walford, J. ; Ekberg, M. ; Hogfeldt, P. ; ystrym, T.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.879-894,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376