1.

Conference Proceedings
Conference Proceedings
1. The impact of mask topography on binary reticles at the 65nm node
Word, J. ; Belledent, J. ; Trouiller, Y. ; Granik, Y. ; Toublan, O. ; Maurer, W.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.527-536,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. Considerations for the use of defocus models for OPC
Sturtevant, J. L. ; Torres, J. A. ; Word, J. ; Granik, Y. ; LaCour, P.
Pub. info.: Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA.  pp.427-436,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5756
3.

Conference Proceedings
Conference Proceedings
3. Assessing the impact of real world manufacturing lithography variations on post-OPC CD control
Sturtevant, J. L. ; Word, J. ; LaCour, P. ; Park, J. W. ; Smith, D.
Pub. info.: Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA.  pp.240-254,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5756
4.

Conference Proceedings
Conference Proceedings
4. OPC to improve lithographic process window [6156-29]
Word, J. ; Sakajiri, K.
Pub. info.: Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA.  pp.61561I-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6156
5.

Conference Proceedings
Conference Proceedings
5. Interaction of RET and MDP: optimization for reducing the mask writing time
Word, J. ; Schulze, S.F.
Pub. info.: Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA.  pp.170-181,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5379
6.

Conference Proceedings
Conference Proceedings
6. MEEF-based mask inspection
Maurer, W. ; Word, J. ; Schulze, S. F. ; Shang, S. D.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.98-106,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
7.

Conference Proceedings
Conference Proceedings
7. Optimization of data handling prior to fracturing for reduction of mask writing time
Word, J. ; Schulze, S.F.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.766-776,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
8.

Conference Proceedings
Conference Proceedings
8. Correction of long-range effects applied to the 65-nm node [5853-107]
Belledent, J. ; Word, J. ; Trouiller, Y. ; Couderc, C. ; Miramond, C. ; Toublan, O. ; Chapon, J.-D. ; Baron, S. ; Borjon, A. ; Foussadier, F. ; Gardin, C. ; Lucas, K. ; Patterson, K. ; Rody, Y. ; Sundermann, F.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.202-210,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
9.

Conference Proceedings
Conference Proceedings
9. Full-chip-model-based correction of flare-induced linewidth variation
Word, J. ; Belledent, J. ; Trouiller, Y. ; Maurer, W. ; Granik, Y. ; Sahouria, E. ; Toublan, O.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.700-710,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567