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Conference Proceedings

1. Statistical analysis of CD-SEM measurement and process control in the indistinguishable multi-process patterns [6152-100]

Yang, D. S. ; Jung, M. H. ; Lee, Y. M. ; Koh, C. W. ; Yeo, G. S. ; Woo, S. G. ; Cho, H. K. ; Moon, J. T.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XX. pp.61522K-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6152

Conference Proceedings

2. Defect inspection of EUVmask blank using confocal microscopy: simulation and experiment [6151-49]

Kim, S. S. ; Park, J. ; Chalykh, R. ; Kang, J. ; Lee, S. ; Woo, S. G. ; Cho, H. K. ; Moon, J. T.

Pub. info.:	Emerging Lithographic Technologies X. pp.61511C-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6151

Conference Proceedings

3. Investigation on polarization monitoring mask: pattern design and experimental verification [6152-60]

Hwang, C. ; Park, D. W. ; Shin, J. H. ; Nam, D. S. ; Lee, S. J ; Woo, S. G. ; Cho, H. K. ; Moon, J. T.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XX. pp.61521M-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6152

Conference Proceedings

4. Macro analysis of line edge and line width roughness [6152-33]

Shin, J. ; Yoon, J. ; Jung, Y. ; Lee, S. ; Woo, S. G. ; Cho, H. -K. ; Moon, J. -T.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XX. pp.61520X-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6152