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57 results

Conference Proceedings

1. Factors affecting the dissolution rate of novolac resins II:developer composition effects

Henderson,C.L. ; Tsiartas,P.C. ; Simpson,L.L. ; Clayton,K.D. ; Pancholi,S. ; Pawlowski,A.R. ; Willson,C.G.

Pub. info.:	Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California. pp.481-490, 1996. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2724

Conference Proceedings

2. Probabilistic model for the mechanism of phenolic polymer dissolution

Flanagin,L.W. ; McAdams,C.L. ; Tsiartas,P.C. ; Henderson,C.L. ; Hinsberg,W.D. ; Willson,C.G.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.268-277, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

3. Top-surface imaging through silylation

Postnikov,S.V. ; Somervell,M.H. ; Henderson,C.L. ; Katz,S. ; Willson,C.G. ; Byers,J.D. ; Qin,A. ; Lin,Q.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 2 pp.997-1008, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

4. Improved simulation of photoresists using new development models

Dammel,R.R. ; Sagan,J.P. ; Kokinda,E. ; Eilbeck,N. ; Mack,C.A. ; Arthur,G.G. ; Henderson,C.L. ; Scheer,S.A. ; Rathsack,B.M. ; Willson,C.G.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.401-416, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

5. Improving the performance of 193-nm photoresists based on alicyclic polymers

Patterson,K. ; Okoroanyanwu,U. ; Shimokawa,T. ; Cho,S. ; Byers,J.D. ; Willson,C.G.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 1 pp.425-437, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

6. Non-chemically amplified 248-nm resist materials

Willson,C.G. ; Yueh,W. ; Leeson,M.J. ; Steinhasler,T. ; McAdams,C.L. ; Dammel,R.R. ; Sounik,J.R. ; Aslam,M. ; Vicari,R. ; Sheehan,M.

Pub. info.:	Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.226-237, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3049

Conference Proceedings

7. Novel functional nortricyclene polymers and copolymers for 248-and 193-nm chemically amplified resists

Niu,Q.J. ; Frechet,J.M.J. ; Okoroanyanwu,U. ; Byers,J.D. ; Willson,C.G.

Pub. info.:	Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.113-123, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3049

Conference Proceedings

8. New single-layer positive photoresists for 193-nm photolithography

Okoroanyanwu,U. ; Shimokawa,T. ; Byers,J.D. ; Medeiros,D.R. ; Willson,C.G. ; Niu,Q.J. ; Frechet,J.M.J. ; Allen,R.D.

Pub. info.:	Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.92-103, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3049

Conference Proceedings

9. Photoresist materials:a historical perspective

Willson,C.G. ; Dammel,R.R. ; Reiser,A.

Pub. info.:	Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.28-41, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3049

10.

Conference Proceedings

10. Photoresist characterization for lithography simulation:IV.Processing effects on resist parameters

Henderson,C.L. ; Tsiartas,P.C. ; Flanagin,L.W. ; Pancholi,S. ; Chowdhury,S.A. ; Dombrowski,K.D. ; Chinwalla,A.N. ; Willson,C.G.

Pub. info.:	Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.212-223, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3049

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