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11 results

Conference Proceedings

1. Characterization of an advanced-performance reticle defect inspection algorithm

Wiley,J.N. ; Aquino,C. ; Burnham,D.V. ; Vacca,A.

Pub. info.:	Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan. pp.445-461, 1997. Bellingham, Washington. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3096

Conference Proceedings

2. Accelerated yield learning in agressive lithography

Monahan,K.M. ; Ashkenaz,S.M. ; Chen,X. ; Lord,P.J. ; Merrill,M.A. ; Quattrini,R. ; Wiley,J.N.

Pub. info.:	Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California. pp.492-503, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3998

Conference Proceedings

3. High-resolution ultraviolet defect inspection of DAP(darkfield alternate phase)reticles

Liebmann,L.W. ; Mansfield,S.M. ; Wong,A.K. ; Smolinski,J.G. ; Peng,S. ; Kimmel,K.R. ; Rudzinski,M.W. ; Wiley,J.N. ; Zurbrick,L.S.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part1 pp.148-161, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

4. Defect inspection and linewidth measurement of SCALPEL thin membrane masks using optical transmission

Farrow,R.C. ; Blakey,M.I. ; Kasica,R.J. ; Liddle,J.A. ; Mkrtchyan,M.M. ; Novembre,A.E. ; Peabody,M.L. ; Saunders,T.E. ; Windt,D.L. ; Zurbrick,L.S. ; Wiley,J.N. ; Aquino,C. ; Hentschel,S.L. ; Davis,L.C. ; Boyer,B.

Pub. info.:	Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California. pp.221-231, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3332

Conference Proceedings

5. Inspecting the new generation of reticles using UV imaging

Merrill,M. ; Wiley,J.N. ; Eynon,B.G.

Pub. info.:	15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98 : 16-17 November 1998, Munich-Unterhaching, Germany. pp.55-62, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3665

Conference Proceedings

6. Multibeam high-resolution UV wavelength reticle inspection

Hung,C.C. ; Yoo,C.S. ; Lin,C.H. ; Volk,W.W. ; Wiley,J.N. ; Khanna,S. ; Biellak,S. ; Wang,D.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VIII. pp.520-531, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4409

Conference Proceedings

7. Multibeam high-resolution UV wavelength reticle inspection

Hung,C.C. ; Yoo,C.S. ; Lin,C.-H. ; Volk,W.W. ; Wiley,J.N. ; Khanna,S. ; Biellak,S. ; Wang,D.

Pub. info.:	20th Annual BACUS Symposium on Photomask Technology. pp.165-172, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4186

Conference Proceedings

8. Reticle inspection system using DUV wavelength and new algorithm platform for advanced reticle inspection for 0.13-ｦﾌm technology node

Alles,D. ; Beek,P.Ter ; Juang,S. ; Wiley,J.N. ; Hsia,K.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VII. pp.462-471, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4066

Conference Proceedings

9. Printability of backside reticle defects

Volk,W. ; Wiley,J.N. ; Reynolds,J.A.

Pub. info.:	Photomask and X-Ray Mask Technology V. pp.579-585, 1998. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3412

10.

Conference Proceedings

10. High-resolution UV wavelength reticle inspection

Merrill,M. ; Garcia,H. ; Schuda,S.J. ; Odisho,W. ; Wiley,J.N.

Pub. info.:	Photomask and X-Ray Mask Technology V. pp.568-578, 1998. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3412

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