1.

Conference Proceedings
Conference Proceedings
1. Alt-phase shift mask technology for 65nm logic applications [6154-22]
Chakravorty, K. K. ; Henrichs, S. ; Qiu, W. ; Chavez, J. L. ; Liu, Y.-P. ; Ghadiali, F. ; Yung, K. ; Wilcox, N. ; Silva, M. ; Ma, J. ; Wu, P. ; Irvine, B. ; Yun, H. ; Cheng, W H ; Farnsworth, J
Pub. info.: Optical Microlithography XIX.  pp.61540M-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
2.

Conference Proceedings
Conference Proceedings
2. Variable shaped beam writing throughput at the 45nm node and beyond [6349-31]
Sowers, A. ; Shumway, M. ; Kamna, M. ; Wilcox, N. ; Vernon, M. ; Cole, D. ; Chandramouli, M.
Pub. info.: Photomask Technology 2006.  pp.63490V-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
3.

Conference Proceedings
Conference Proceedings
3. Reduction of radial CD errors and Cr loading effects in 90-nm binary NCAR mask process through chrome etch DOE
Ma, J. ; Li, C. ; Bassist, L. ; Pekney, M. ; Wilcox, N. ; Farnsworth, J. ; Lauder, E. ; Krishnakumar, B.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.167-175,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
4.

Conference Proceedings
Conference Proceedings
4. Electron beam lithography time dependent dose correction for reticle CD uniformity enhancement [6283-05]
Wilcox, N. ; Vernon, M. ; Jamieson, A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.628307-628307,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283