1.

Conference Proceedings
Conference Proceedings
1. Fluoropolyrners for 157-nm lithography:optical properties from VUV absorbance and ellipsometry measurements
French,R.H. ; Wheland,R.C. ; Jones,D.J. ; Hilfiker,J.N. ; Synowicki,R.A. ; Zumsteg,F.C. ; Feldman,J. ; Feiring,A.E.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1491-1502,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
2.

Conference Proceedings
Conference Proceedings
2. Materials design and development of fluoropolymers for use as pellicles in 157-nm photolithography
French,R.H. ; Gordon,J.S. ; Jones,D.J. ; Lemon,M.F. ; Wheland,R.C. ; Zhang,E. ; Zumsteg Jr.,F.C. ; Sharp,K.G. ; Qiu,W.
Pub. info.: Optical Microlithography XIV.  4346  pp.89-97,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346