1.

Conference Proceedings
Conference Proceedings
1. CMP Applications for Sub-0.25μm Process Technologies
Pramanik, D. ; Weling, M. ; Lin, X.-W.
Pub. info.: Proceedings of the Second International Symposium on Chemical Mechanical Planariarization [sic] in Integrated Circuit Device Manufacturing.  pp.1-8,  1998.  Pennington, N. J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 98-7
2.

Conference Proceedings
Conference Proceedings
2. A High Oxide:Nitride Selectivity CMP Slurry for Shallow Trench Isolation
Laparra, O. ; Weling, M. ; Hosali, S. ; Lavoie, R.
Pub. info.: Proceedings of the Second International Symposium on Chemical Mechanical Planariarization [sic] in Integrated Circuit Device Manufacturing.  pp.218-234,  1998.  Pennington, N. J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 98-7
3.

Conference Proceedings
Conference Proceedings
3. Dual Salicide and Self-aligned Metal Gate Formation for Sub-0.25μm CMOS Technologies Using CMP
Weling, M. ; Lin, X.-W.
Pub. info.: Proceedings of the Second International Symposium on Chemical Mechanical Planariarization [sic] in Integrated Circuit Device Manufacturing.  pp.19-25,  1998.  Pennington, N. J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 98-7
4.

Conference Proceedings
Conference Proceedings
4. Trenching of Silicon During LDD Spacer Oxide Etching
Gabriel, C. ; Weling, M.
Pub. info.: Proceedings of the Symposium on Highly Selective Dry Etching and Damage Control.  pp.235-242,  1993.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1993-21
5.

Conference Proceedings
Conference Proceedings
5. Self-Aligned Gate Metallization Processes With Low-Thermal Budget
Lin, X. W. ; Weling, M.
Pub. info.: Advanced interconnects and contact materials and processes for future integrated circuits : symposium held April 13-16, 1998, San Francisco, California, U.S.A..  pp.485-,  1998.  Warrendale, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 514
6.

Conference Proceedings
Conference Proceedings
6. Investigation of Undesirable Film Deposition in Contacts During Contact Etch
Weling, M. ; Gabriel, C.
Pub. info.: ULSI science and technology, 1995 : proceedings of the Fifth International Symposium on Ultra Large Scale Integration Science and Technology.  pp.258-265,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-5
7.

Conference Proceedings
Conference Proceedings
7. Optimization of a Chemical Mechanical Polishing Process for Dielectric Planarization
Weling, M. ; Drill, C.
Pub. info.: ULSI science and technology, 1995 : proceedings of the Fifth International Symposium on Ultra Large Scale Integration Science and Technology.  pp.302-310,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-5
8.

Conference Proceedings
Conference Proceedings
8. Gate Oxide Damage Reduction during LDD Spacer Oxide Etch
Gabriel, C. ; Weling, M.
Pub. info.: Proceedings of the tenth symposium on plasma processing.  pp.144-152,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-20
9.

Conference Proceedings
Conference Proceedings
9. Contact and Spacer Etch Dependent Junction Leakage in Sub-Micron CMOS Technology
Weling, M. ; Gabriel, C.
Pub. info.: Proceedings of the tenth symposium on plasma processing.  pp.153-162,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-20
10.

Conference Proceedings
Conference Proceedings
10. Oxide Etch Induced Silicon Damage Evaluation Using Minority Carrier Lifetime
Weling, M. ; Gabriel, C.
Pub. info.: Proceedings of the Symposium on Diagnostic Techniques for Semiconductor Materials and Devices.  pp.143-150,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-33