1.

Conference Proceedings
Conference Proceedings
1. Image placement error due to pailern transfer for EUV masks
Masnyj, Z.S. ; Wasson, J.R. ; Lu, B. ; Weisbrod, E. ; Mangat, P.J.S. ; Nordquist, K.J. ; Ainley, E.S. ; Dauksher, W.J. ; Resnick, D.J.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1150-1154,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
2.

Conference Proceedings
Conference Proceedings
2. Design and method of fabricating phase-shift masks for extreme-ultraviolet lithography by partial etching into the EUV multilayer mirror
Han, S.-I. ; Weisbrod, E. ; Xie, Q. ; Mangat, P.J.S. ; Hector, S.D. ; Dauksher, W.J.
Pub. info.: Emerging Lithographic Technologies VII.  1  pp.314-330,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037
3.

Conference Proceedings
Conference Proceedings
3. Integration of antireflection coatings on EUV absorber stacks
Wasson, J.R. ; Han, S.-I. ; Edwards, N.V. ; Weisbrod, E. ; Dauksher, W.J. ; Mangat, P.J.S. ; Pettibone, D.W.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.382-388,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
4.

Conference Proceedings
Conference Proceedings
4. Effects of reticle reflectance on lithography
Cummings, K.D. ; Geh, B. ; Lu, B. ; Wasson, J.R. ; Weisbrod, E. ; Dauksher, W.J. ; Nordquist, K.J. ; Mangat, P.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.256-265,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
5.

Conference Proceedings
Conference Proceedings
5. Single-layer and bilayer resist processes for EUV-type integrations
Peters, R.D. ; Parker, C. ; Cobb, J. ; Luckowski, E. ; Weisbrod, E. ; Dauksher, B.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.746-756,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
6.

Conference Proceedings
Conference Proceedings
6. Development of phase shift masks for extreme ultraviolet lithography and optical evaluation of phase shift materials
Han, S.-I. ; Weisbrod, E. ; Wasson, J.R. ; Gregory, R. ; Xie, Q. ; Mangat, P.J.S. ; Hector, S.D. ; Dauksher, W.J. ; Rosfjord, K.M.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.261-270,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374
7.

Conference Proceedings
Conference Proceedings
7. Process latitude measurements and their implications for CD control in EUV lithography
Cobb, J. ; Peters, R. ; Postnikov, S. ; Hector, S.D. ; Lu, B. ; Weisbrod, E. ; Wasson, J.R. ; Mangat, P. ; O'Connell, D.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.43-52,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374
8.

Conference Proceedings
Conference Proceedings
8. CD uniformity dependence on CAR PEB process and its improvement for EUVL mask fabrication
Lu, B. ; Wasson, J.R. ; Weisbrod, E. ; Mangat, P. ; Ainley, E. ; Rios, A. ; Nordquist, K.J.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.1057-1064,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
9.

Conference Proceedings
Conference Proceedings
9. Evaluation of a high-performance chemically amplified resist for EUVL mask fabrication
Lu, B. ; Weisbrod, E. ; Mangat, P.J.S. ; Nordquist, K.J. ; Ainley, E.S.
Pub. info.: Emerging Lithographic Technologies VII.  2  pp.952-961,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037