1.

Conference Proceedings
Conference Proceedings
1. Qualification of alternating PSM: defect inspection analysis in comparison to wafer printing results
Dettmann, W. ; Heumann, J.P. ; Hagner, T. ; Koehle, R. ; Rahn, S. ; Verbeek, M. ; Zarrabian, M. ; Weckesser, J. ; Hennig, M. ; Morgana, N.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.415-422,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
2.

Conference Proceedings
Conference Proceedings
2. Hard phase-shifting masks for the 65-nm node: a performance comparison
Pforr, R. ; Hennig, M. ; Koehle, R. ; Morgana, N. ; Thiele, J. ; Weckesser, J.
Pub. info.: Optical Microlithography XVII.  pp.212-221,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377