1.

Conference Proceedings
Conference Proceedings
1. Gate Dielectrics Formed by Remote Plasma Nitridaion of Ultrathin In-Situ Steam Generated (ISSG) Oxides
Watt, V.H.C. ; Torres, K. ; Jackson, M.D. ; Huff, H.R. ; Abmed, K. ; Jallepally, R. ; Noble, D. ; Toni, N. ; Miner, G.
Pub. info.: Rapid thermal and other short-time processing technologies : proceedings of the international symposium.  pp.231-238,  2000.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2000-9
2.

Conference Proceedings
Conference Proceedings
2. Direct Bonding of LPCVD Silicon Oxide Thin Films Deposited from N2O and SiH4
Watt, V.H.C. ; Bower, R. ; Chan, W. ; Hong, L. ; Moinpour, M.
Pub. info.: Proceedings of the Third International Symposium on Semiconductor Wafer Bonding : physics and applications.  pp.573-578,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-7
3.

Conference Proceedings
Conference Proceedings
3. Mechanical Considerations for Direct Wafer Bonding
Bower, R.W. ; Hung, L. ; Chan, W. ; Watt, V.H.C.
Pub. info.: Proceedings of the Third International Symposium on Semiconductor Wafer Bonding : physics and applications.  pp.107-114,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-7
4.

Conference Proceedings
Conference Proceedings
4. Characterization Of Silicon Dioxide Films Deposited In A Vertical Diffusion Furnace For Medium Temperature Applications
Watt, V.H.C. ; Nakatani, D. ; Moinpour, M. ; Hwang, D. ; Lu, W.
Pub. info.: Proceedings of the third Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films.  pp.328-337,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-16
5.

Conference Proceedings
Conference Proceedings
5. Ultrathin CVD Gate Dielectrics for 130 nm Technology Node
Watt, V.H.C. ; Karamcheti, A. ; Luo, T.-Y ; Al-Shareef, H.N. ; Jackson, M.D. ; Huff, H.R.
Pub. info.: Rapid thermal and other short-time processing technologies : proceedings of the international symposium.  pp.169-178,  2000.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2000-9
6.

Conference Proceedings
Conference Proceedings
6. Development of Silicon Nitride Films for Gate Dielectric Applications
Brady, D. ; Watt, V.H.C. ; Karamcheti, A. ; Vishnubhotla, L. ; Bersuker, G. ; Kim, S. ; Zietzoff, P. ; Gilmer, M. ; Guan, J. ; Torres, K. ; Nguyen, B. ; Williamson, G. ; Brown, G. ; Gale, G. ; Jackson, M. ; Huff, H.R.
Pub. info.: Silicon nitride and silicon dioxide thin insulating films, proceedings of the fifth International Symposium.  pp.207-218,  1999.  Pennington, New Jersey.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-6
7.

Conference Proceedings
Conference Proceedings
7. Remote Plasma Nitridation of In Situ Steam Generated (ISSG) Oxide
Al-Shareef, Husam N. ; Karamcheti, A. ; Luo, T.T. ; Brown, G.A. ; Watt, V.H.C. ; Jackson, M.D. ; Huff, H.R. ; Jallepally, R. ; Noble, D. ; Tam, N. ; Miner, G.
Pub. info.: Gate stack and silicide issues in silicon processing : symposium held April 25-27, 2000, San Francisco, California, U.S.A..  pp.C7.15-,  2001.  Warrendale, PA.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 611
8.

Conference Proceedings
Conference Proceedings
8. Silicon Oxynitride Films formed by Rapid Ther-mal Chemical Vapor Deposition for VLSI Applications
Vogel, E.M. ; Wortman, J.J. ; McLarty, P.K. ; Watt, V.H.C. ; Kirkpatrick, B.
Pub. info.: Proceedings of the Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films.  pp.394-407,  1997.  Pennington, New Jersey.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-10
9.

Conference Proceedings
Conference Proceedings
9. TEOS/Ozone APCVD Thin SiO2 Sub 0.5 mm LDD Spacer Applications
Moinpour, M. ; Lu, W.-J. ; Sadjadi, R. ; Li, J. ; Moghadam, F. ; Wada, O. ; Watt, V.H.C.
Pub. info.: ULSI science and technology, 1995 : proceedings of the Fifth International Symposium on Ultra Large Scale Integration Science and Technology.  pp.101-108,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-5