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11 results

Conference Proceedings

1. Image placement error due to pailern transfer for EUV masks

Masnyj, Z.S. ; Wasson, J.R. ; Lu, B. ; Weisbrod, E. ; Mangat, P.J.S. ; Nordquist, K.J. ; Ainley, E.S. ; Dauksher, W.J. ; Resnick, D.J.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part Two pp.1150-1154, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

Conference Proceedings

2. Recovery of Mo/Si-multilayer-coated LTEM substrate

Mangat, P.S.J. ; Talin, A.A. ; Hooper, A.F. ; Convey, D. ; Han, S.-I. ; Wasson, J.R.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part One pp.426-430, 2002. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

Conference Proceedings

3. Integration of antireflection coatings on EUV absorber stacks

Wasson, J.R. ; Han, S.-I. ; Edwards, N.V. ; Weisbrod, E. ; Dauksher, W.J. ; Mangat, P.J.S. ; Pettibone, D.W.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part One pp.382-388, 2002. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

Conference Proceedings

4. Novel design of att-PSM structure for extreme-ultraviolet lithography and enhancement of image contrast during inspection

Han, S.-I. ; Wasson, J.R. ; Mangat, P.J.S. ; Cobb, J.L. ; Lucas, K. ; Hector, S.D.

Pub. info.:	Emerging Lithographic Technologies VI. Part One pp.481-494, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4688

Conference Proceedings

5. Effects of reticle reflectance on lithography

Cummings, K.D. ; Geh, B. ; Lu, B. ; Wasson, J.R. ; Weisbrod, E. ; Dauksher, W.J. ; Nordquist, K.J. ; Mangat, P.

Pub. info.:	23rd Annual BACUS Symposium on Photomask Technology. pp.256-265, 2003. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5256

Conference Proceedings

6. Inspection of EUV reticles

Pettibone, D.W. ; Veldman, A. ; Liang, T. ; Stivers, A.R. ; Mangat, P.J. ; Lu, B. ; Hector, S.D. ; Wasson, J.R. ; Bleadel, K.L. ; Fisch, E. ; Walker, D.M.

Pub. info.:	Emerging Lithographic Technologies VI. Part One pp.363-374, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4688

Conference Proceedings

7. 157-nm attenuated phase-shift mask materials with irradiation stability

Wasson, J.R. ; Edwards, N.V. ; Lu, B. ; Mangat, P. ; Grenville, A.

Pub. info.:	23rd Annual BACUS Symposium on Photomask Technology. pp.199-203, 2003. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5256

Conference Proceedings

8. Development of phase shift masks for extreme ultraviolet lithography and optical evaluation of phase shift materials

Han, S.-I. ; Weisbrod, E. ; Wasson, J.R. ; Gregory, R. ; Xie, Q. ; Mangat, P.J.S. ; Hector, S.D. ; Dauksher, W.J. ; Rosfjord, K.M.

Pub. info.:	Emerging Lithographic Technologies VIII. pp.261-270, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5374

Conference Proceedings

9. Process latitude measurements and their implications for CD control in EUV lithography

Cobb, J. ; Peters, R. ; Postnikov, S. ; Hector, S.D. ; Lu, B. ; Weisbrod, E. ; Wasson, J.R. ; Mangat, P. ; O'Connell, D.

Pub. info.:	Emerging Lithographic Technologies VIII. pp.43-52, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5374

10.

Conference Proceedings

10. CD uniformity dependence on CAR PEB process and its improvement for EUVL mask fabrication

Lu, B. ; Wasson, J.R. ; Weisbrod, E. ; Mangat, P. ; Ainley, E. ; Rios, A. ; Nordquist, K.J.

Pub. info.:	23rd Annual BACUS Symposium on Photomask Technology. pp.1057-1064, 2003. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5256

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Author: Wasson, J.R.