1.

Conference Proceedings
Conference Proceedings
1. Design of an etch-resistant cyclic olefin photoresist
Allen,R.D. ; Opitz,J. ; Wallow,T.I. ; DiPietro,R.A. ; Hofer,D.C. ; Jayaraman,S. ; Hullihan,K.A. ; Rhodes,L.F. ; Goodall,B.L. ; Shick,R.A.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.463-471,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
2.

Conference Proceedings
Conference Proceedings
2. Recent advances in 193-nm single-layer photoresists based on alternating copolymers of cycloolefins
Houlihan,F.M. ; Wallow,T.I. ; Timko,A.G. ; Neria,E. ; Hutton,R.S. ; Cirelli,R.A. ; Nalamasu,O. ; Reichmanis,E.
Pub. info.: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.84-91,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3049
3.

Conference Proceedings
Conference Proceedings
3. Dissolution/swelling behavior of cycloolefin polymers in aqueous base
Ito,H. ; Allen,R.D. ; Opitz,J. ; Wallow,T.I. ; Truong,H.D. ; Hofer,D.C. ; Varanasi,P.R. ; Jordhamo,G.M. ; Jayaraman,S. ; Vicari,R.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.2-12,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
4.

Conference Proceedings
Conference Proceedings
4. Reactive ion etching of 193-nm resist candidates: current platforms and future requirements
Wallow,T.I. ; Brock,P.J. ; DiPietro,R.A. ; Allen,R.D. ; Opitz,J. ; Sooriyakumaran,R. ; Hofer,D.C. ; Meute,J. ; Byers,J.D. ; Rich,G.K. ; McCallum,M. ; Schuetze,S. ; Jayaraman,S. ; Hullihen,K. ; Vicari,R. ; Rhodes,L.F. ; Goodall,B.L. ; Shick,R.A.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.92-101,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
5.

Conference Proceedings
Conference Proceedings
5. Overview of photoacid generator design for acetal resist systems
Houlihan,F.M. ; Nalamasu,O. ; Reichmanis,E. ; Timko,A.G. ; Varlemann,U. ; Wallow,T.I. ; Bantu,N. ; Biafore,J. ; Sarubbi,T.R. ; Falcigno,P.A. ; Kirner,H.-J. ; Munzel,N. ; Petschel,K. ; Schacht,H.-T.
Pub. info.: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.466-472,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3049
6.

Conference Proceedings
Conference Proceedings
6. Evaluation of cycloolefin-maleic anhydride alternating copolymers as single-layer photoresists for 193-nm photolithography
Wallow,T.I. ; Houlihan,F.M. ; Nalamasu,O. ; Chandross,E.A. ; Neenan,T.X. ; Reichmanis,E.
Pub. info.: Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California.  pp.355-364,  1996.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2724
7.

Conference Proceedings
Conference Proceedings
7. Progress toward developing high-performance 193-nm single-layer positive resist based on functionalized poly(norbornenes)
Varanasi,P.R. ; Jordhamo,G.M. ; Lawson,M.C. ; Chen,K.-J. ; Brunsvold,W.R. ; Hughes,T. ; Keller,R. ; Khojasteh,M. ; Li,W. ; Allen,R.D. ; Ito,H. ; Opitz,J. ; Truong,H.D. ; Wallow,T.I.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part2  pp.1157-1162,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
8.

Conference Proceedings
Conference Proceedings
8. Lithographic characteristics of 193-nm resists imaged at 193 and 248 nm
Opitz,J. ; Allen,R.D. ; Wallow,T.I. ; Wallraff,G.M. ; Hofer,D.C.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.571-578,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
9.

Conference Proceedings
Conference Proceedings
9. New approaches to production-worthy 193-nm photoresists based on acrylic copolymers
Wallow,T.I. ; Allen,R.D. ; Opitz,J. ; Dipietro,R.A. ; Brock,P.J. ; Sooriyakumaran,R. ; Hofer,D.C.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.579-586,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
10.

Conference Proceedings
Conference Proceedings
10. "193-nm single-layer resist materials: total consideration of design, physical properties, and lithographic performances on all major alicyclic platform chemistries"
Kajita,T. ; Nishimura,Y. ; Yamamoto,M. ; Ishii,H. ; Soyano,A. ; Kataoka,A. ; Slezak,M. ; Shimizu,M. ; Varanasi,P.R. ; Jordhamo,G. ; Lawson,M.C. ; Chen,R. ; Brunsvold,W.R. ; Li,W. ; Allen,R.D. ; Ito,H. ; Truong,H.D. ; Wallow,T.I.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.712-724,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345