1.

Conference Proceedings
Conference Proceedings
1. Influence of lens aberrations on high-resolution imaging on low-reflectivity substrates
Martin,B. ; Arthur,C.G. ; Wallace,C.
Pub. info.: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.372-383,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3332
2.

Conference Proceedings
Conference Proceedings
2. Definition and control of contact holes in a CMP process
Wallace,C. ; Martin,B. ; Arthur,G.G.
Pub. info.: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.594-602,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3332
3.

Conference Proceedings
Conference Proceedings
3. Comparison of recent development models in optical lithography simulation
Arthur,G.G. ; Wallace,C. ; Martin,B.
Pub. info.: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.538-549,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3332
4.

Conference Proceedings
Conference Proceedings
4. Effect of photoresist contrast on intrafield critical dimensions in sub-half-micron optical lithography
Wallace,C. ; Martin,B. ; Arthur,G.G.
Pub. info.: Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland.  pp.213-221,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3741
5.

Conference Proceedings
Conference Proceedings
5. Pitch-dependent intrafield dimensional offsets in advanced lithography
Wallace,C. ; Martin,B. ; Arthur,G.G.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.656-662,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
6.

Conference Proceedings
Conference Proceedings
6. Optimum design for optical proximity correction in submicron bipolar technology using critical shape error analysis
Arthur,G.G. ; Martin,B. ; Wallace,C.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.631-640,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
7.

Conference Proceedings
Conference Proceedings
7. Application of optical proximity correction in manufacturing and its effect on process control
Wallace,C. ; Duncan,C. ; Martin,B.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.663-670,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
8.

Conference Proceedings
Conference Proceedings
8. Optimizaion of dielectric antireflective coatings on a transparent substrate in sub-half-micron CMOS technology
Arthur,G.G. ; Martin,B. ; Wallace,C.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.644-652,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344
9.

Conference Proceedings
Conference Proceedings
9. Full-chip optical proximity correction using lithography simulation
Arthur,G.G. ; Martin,B. ; Wallace,C. ; Rosenbusch,A. ; Fryer,H.
Pub. info.: 18th Annual BACUS Symposium on Photomask Technology and Management.  pp.574-584,  1998.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3546