1.

Conference Proceedings
Conference Proceedings
1. Use of 13C-labelled Compounds to Probe Catalytic Coke Formation in FCC
Goode, N. ; Kettley, G. ; Snape, Colin E. ; Wallace, C.
Pub. info.: AIChE 1999 SPRING NATIONAL MEETING.  1999.  New York.  American Institute of Chemical Engineers
Title of ser.: AIChE meeting [papers]
Ser. no.: 1999
2.

Technical Paper
Technical Paper
2. StratoLink: Giving Students of all Ages Access to Near Space
Byrd, W. ; Cook, M. ; Wallace, C. ; Hauber, E.
Pub. info.: AIAA meeting papers on disc.  2004.  [Reston, Va.].  American Institute of Aeronautics and Astronautics
Title of ser.: AIAA Paper : AIAA Space Conference and Exposition
Ser. no.: 2004
3.

Technical Paper
Technical Paper
3. Picosatellites and Small Scientific Balloons: An Innovative Approach in Hands-on Engineering Education
Cook, M. ; Wallace, C. ; Leavitt, G. ; Calgaard, T.
Pub. info.: AIAA meeting papers on disc.  2004.  [Reston, Va.].  American Institute of Aeronautics and Astronautics
Title of ser.: AIAA Paper : AIAA Space Conference and Exposition
Ser. no.: 2004
4.

Technical Paper
Technical Paper
4. A project overview of High Altitude Reduced Gravity Vehicle Experiments
Leavitt, G. ; Wallace, C. ; Cook, M.
Pub. info.: AIAA meeting papers on disc.  2005.  [Reston, Va.].  American Institute of Aeronautics and Astronautics
Title of ser.: AIAA Paper : AIAA Aviation Technology, Integration and Operations Conference (ATIO)
Ser. no.: 5th
5.

Conference Proceedings
Conference Proceedings
5. Detection of glaucomatous retinal nerve fiber layer damage by scanning laser polarimetry with custom corneal compensation
Zhou, Q. ; Reed, J. ; Betts, R.W. ; Trost, P.K. ; Lo, P.-W. ; Wallace, C. ; Bienias, R.H. ; Li, G. ; Winnick, R. ; Papworth, W.A. ; Sinai, M.
Pub. info.: Ophthalmic Technologies XIII.  pp.32-41,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4951
6.

Conference Proceedings
Conference Proceedings
6. Optimization of resist shrink techniques for contact hole and metal trench ArF lithography at the 90-nm technology node
Wallace, C. ; Schacht, J. ; Huang, I.H. ; Hsu, R.H.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.238-244,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376