1.

Conference Proceedings
Conference Proceedings
1. Application of vector scan electron-beam lithography to 45-nm node extreme-ultraviolet lithography reticles
Walker, D.M. ; Mathur, D.P. ; Su, C. ; Huang, T.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.872-879,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
2.

Conference Proceedings
Conference Proceedings
2. Inspection of EUV reticles
Pettibone, D.W. ; Veldman, A. ; Liang, T. ; Stivers, A.R. ; Mangat, P.J. ; Lu, B. ; Hector, S.D. ; Wasson, J.R. ; Bleadel, K.L. ; Fisch, E. ; Walker, D.M.
Pub. info.: Emerging Lithographic Technologies VI.  Part One  pp.363-374,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4688