1.

Conference Proceedings
Conference Proceedings
1. Implementation of Reference Measurement System using CD-AFM
Dixson, R.G. ; Guerry, A. ; Bennett, M.H. ; Vorburger, T.V. ; Bunday, B.D.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.150-165,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
2.

Conference Proceedings
Conference Proceedings
2. Subnanometer wavelength metrology of lithographically prepraed structures: a comparison of neutron and X-ray scattering.
Jones, R.L. ; Hu, T. ; Lin, E.K. ; Wu, W. ; Casa, D.M. ; Orji, N.G. ; Vorburger, T.V. ; Bolton, P.J. ; Barclay, G.G.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.191-199,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
3.

Conference Proceedings
Conference Proceedings
3. An image stitching method to eliminate the distortion of the sidewall in linewidth measurement
Zhao, X. ; Fu, J. ; Chu, W. ; Nguyen, C. ; Vorburger, T.V.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.363-373,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
4.

Conference Proceedings
Conference Proceedings
4. Study of an image stitching method for linewidth measurement
Chu, W. ; Zhao, X. ; Fu, J. ; Vorburger, T.V.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.776-783,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
5.

Conference Proceedings
Conference Proceedings
5. Determination of optimal parameters for CD-SEM measurement of line-edge roughness
Bunday, B.D. ; Bishop, M. ; McCormack, D.W., Jr. ; Villarrubia, J.S. ; Vladar, A.E. ; Dixson, R. ; Vorburger, T.V. ; Orji, N.G. ; Allgair, J.A.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.515-533,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
6.

Conference Proceedings
Conference Proceedings
6. Toward traceability for at-line AFM dimensional metrology
Dixson, R.G. ; Guerry, A. ; Bennett, M.H. ; Vorburger, T.V. ; Postek, M.T., Jr.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part One  pp.313-335,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689