1.

Conference Proceedings
Conference Proceedings
1. Formation and detection of subpellicle defects by exposure to DUV system illumination
Grenon,B.J. ; Peters,C.R. ; Bhattacharyya,K. ; Volk,W.W.
Pub. info.: 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents : 15-16 November 1999, Munich, Germany.  pp.47-61,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3996
2.

Conference Proceedings
Conference Proceedings
2. Multibeam high-resolution UV wavelength reticle inspection
Hung,C.C. ; Yoo,C.S. ; Lin,C.H. ; Volk,W.W. ; Wiley,J.N. ; Khanna,S. ; Biellak,S. ; Wang,D.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.520-531,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
3.

Conference Proceedings
Conference Proceedings
3. Multibeam high-resolution UV wavelength reticle inspection
Hung,C.C. ; Yoo,C.S. ; Lin,C.-H. ; Volk,W.W. ; Wiley,J.N. ; Khanna,S. ; Biellak,S. ; Wang,D.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.165-172,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
4.

Conference Proceedings
Conference Proceedings
4. Multibeam high-resolution die-to-database reticle inspection
Volk,W.W. ; Broadbent,W.H. ; Garcia,H.I. ; Watson,S.G. ; Lim,P.M. ; Ruch,W.E.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.111-121,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562