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15 results

Conference Proceedings

1. Edge determination for polycrystalline silicon lines on gate oxide

Villarrubia,J.S. ; Vladar,A.E. ; Lowney,J.R. ; Postek Jr.,M.T.

Pub. info.:	Metrology, inspection, and process control for microlithography XV. pp.147-156, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4344

Conference Proceedings

2. Reference Material 8091: new scanning electron microscope sharpness standard

Vladar,A.E. ; Postek,M.T. ; Zhang,N.-F. ; Larrabee,R.D. ; Jones,S.N. ; Hajdaj,R.E.

Pub. info.:	Metrology, inspection, and process control for microlithography XV. pp.827-834, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4344

Conference Proceedings

3. Active monitoring and control of electron-beam-induced contamination

Vladar,A.E. ; Postek,M.T. ; Vane,R.

Pub. info.:	Metrology, inspection, and process control for microlithography XV. pp.835-843, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4344

Conference Proceedings

4. SEM sentinel-SEM performance measurement system

Damazo,B.N. ; Vladar,A.E. ; Ling,A.V. ; Donmez,M. ; Postek,M.T. ; Jayewardene,E.C.

Pub. info.:	Metrology, inspection, and process control for microlithography XV. pp.773-782, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4344

Conference Proceedings

5. Toward a unified advanced CD-SEM specification for sub-0.18-ｦﾌm technology

Allgair,J. ; Archie,C.N. ; Banke,W. ; Bogardus,H. ; Griffith,J.E. ; Marchman,H.M. ; Postek,M.T. ; Saraf,L.H. ; Schlesinger,J.E. ; Singh,B. ; Sullivan,N.T. ; Trimble,L.E. ; Vladar,A.E. ; Yanof,A.W.

Pub. info.:	Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California. pp.138-150, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3332

Conference Proceedings

6. Measurement of contamination rate and stage drift in scanning electron microscopes

Vladar,A.E.

Pub. info.:	Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California. pp.192-198, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3332

Conference Proceedings

7. Fourier transform feedback tool for scanning electron microscopes used in semiconductor metrology

Postek,M.T. ; Vladar,A.E. ; Davidson,M.P.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XI. pp.68-79, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3050

Conference Proceedings

8. Benchmarking of advanced CD-SEMs against a new unified specification for sub-0.18-μm lithography

Deleporte,A.G. ; Allgair,J. ; Archie,C.N. ; Banke,G.W. ; Postek,M.T. ; Schlesinger,J.E. ; Vladar,A.E. ; Yanof,A.W.

Pub. info.:	Challenges in process integration and device technology : 18-19 September 2000, Santa Clara, USA. pp.42-57, 2000. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4181

Conference Proceedings

9. Statistical measure for the sharpness of SEM images

Zhang,N.F. ; Postek,M.T. ; Larrabee,R.D. ; Vladar,A.E. ; Keery,W.J. ; Jones,S.N.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XI. pp.375-387, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3050

10.

Conference Proceedings

10. Benchmarking of advanced CD-SEMs against the new unified specification for sub-0.18-ｦﾌm lithography

Deleporte,A.G. ; Allgair,J. ; Archie,C.N. ; Banke,G.W. ; Postek,M.T. ; Schlesinger,J.E. ; Vladar,A.E. ; Yanof,A.W.

Pub. info.:	Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California. pp.12-27, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3998

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Author: Vladar,A.E.