1.

Conference Proceedings
Conference Proceedings
1. In-line lithography cluster monitoring and control using integrated scatterometry
Pollentier, I. ; Cheng, S.Y. ; Baudemprez, B. ; Laidler, D. ; van Dommelen, Y. ; Carpaij, R. ; Yu, J. ; Uchida, J. ; Viswanathan, A. ; Chin, D. ; Barry, K. ; Jakatdar, N.
Pub. info.: Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA.  pp.105-115,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5378
2.

Conference Proceedings
Conference Proceedings
2. CISUS: an integrated 3D ultrasound system for IGT using a modular tracking API
Boctor, E.M. ; Viswanathan, A. ; Pieper, S. ; Choti, M.A. ; Taylor, R.H. ; Kikinis, R. ; Fichtinger, G.
Pub. info.: Medical Imaging 2004: Visualization, Image-Guided Procedures, and Display.  pp.247-256,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5367
3.

Conference Proceedings
Conference Proceedings
3. LithoCell-integrated critical dimension metrology
Stirton, J.B. ; Miller, C.W. ; Viswanathan, A. ; Miyagi, M. ; Lane, L. ; Laughery, M.A. ; Parikh, T. ; Chan, K.C. ; Sezginer, A.
Pub. info.: Process and Materials Characterization and Diagnostics in IC Manufacturing.  pp.155-160,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5041
4.

Conference Proceedings
Conference Proceedings
4. Scatterometry feasibility studies for 0.13-micron flash memory lithography applications: enabling integrated metrology
Lensing, K.R. ; Miller, C. ; Chudleigh, G. ; Swain, B. ; Laughery, M. ; Viswanathan, A.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.307-316,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
5.

Conference Proceedings
Conference Proceedings
5. Metrology exposure-induced resist and ARC damage
Yu, J. ; Viswanathan, A. ; Miyagi, M. ; Uchida, J. ; Lane, L. ; Barry, K.A. ; Kajitani, M. ; Kikuchi, T. ; Chan, K.C. ; Stanke, F.E.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.839-848,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
6.

Conference Proceedings
Conference Proceedings
6. Characterization of integrated optical CD for process control
Yu, J. ; Uchida, J. ; van Dommelen, Y. ; Carpaij, R. ; Cheng, S. ; Pollentier, I. ; Viswanathan, A. ; Lane, L. ; Barry, K.A. ; Jakatdar, N.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.1059-1068,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
7.

Conference Proceedings
Conference Proceedings
7. Scatterometry for contact hole lithography
Barry, K.A. ; Viswanathan, A. ; Niu, X. ; Bischoff, J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.1081-1086,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375