1.

Conference Proceedings
Conference Proceedings
1. AVATRELTM DIELECTRIC POLYMERS FOR HDP APPLICATIONS
McDougall,William C. ; Farling,S. ; Shick,R. ; Glukh,S. ; Jayaraman,S.K. ; Rhodes,L.F. ; Vicari,R. ; Kohl,P. ; Bidstrup-Allen,S.A. ; Chiniwalla,P.
Pub. info.: 1999 International Conference on High Density Packaging and MCMs : 6-9 April 1999, The Adam's Mark Hotel, Denver, Colorado.  pp.17-20,  1999.  Reston, VA.  IMAPS
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3830
2.

Conference Proceedings
Conference Proceedings
2. Non-chemically amplified 248-nm resist materials
Willson,C.G. ; Yueh,W. ; Leeson,M.J. ; Steinhasler,T. ; McAdams,C.L. ; Dammel,R.R. ; Sounik,J.R. ; Aslam,M. ; Vicari,R. ; Sheehan,M.
Pub. info.: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.226-237,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3049
3.

Conference Proceedings
Conference Proceedings
3. Dissolution/swelling behavior of cycloolefin polymers in aqueous base
Ito,H. ; Allen,R.D. ; Opitz,J. ; Wallow,T.I. ; Truong,H.D. ; Hofer,D.C. ; Varanasi,P.R. ; Jordhamo,G.M. ; Jayaraman,S. ; Vicari,R.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.2-12,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
4.

Conference Proceedings
Conference Proceedings
4. Reactive ion etching of 193-nm resist candidates: current platforms and future requirements
Wallow,T.I. ; Brock,P.J. ; DiPietro,R.A. ; Allen,R.D. ; Opitz,J. ; Sooriyakumaran,R. ; Hofer,D.C. ; Meute,J. ; Byers,J.D. ; Rich,G.K. ; McCallum,M. ; Schuetze,S. ; Jayaraman,S. ; Hullihen,K. ; Vicari,R. ; Rhodes,L.F. ; Goodall,B.L. ; Shick,R.A.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.92-101,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
5.

Conference Proceedings
Conference Proceedings
5. Synthesis and lithographic performance of highly branched polymers from hydroxphenylmethylcarbinols
Sounik,J.R. ; Vicari,R. ; Lu,P.-H. ; Kokinda,E. ; Ficner,S.A. ; Dammel,R.R.
Pub. info.: Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California.  pp.196-207,  1996.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2724
6.

Conference Proceedings
Conference Proceedings
6. Transparent resins for 157-nm lithography
Dammel,R.R. ; Sakamuri,R. ; Romano,A.R. ; Vicari,R. ; Hacker,C. ; Conley,W. ; Miller,D.A.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.350-360,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345