1.

Conference Proceedings
Conference Proceedings
1. Practical implementation of top-surface imaging process by silylation to sub-0.20-ｦﾌm lithography
Park,B.J. ; Baik,K.H. ; Kim,H.K. ; Kim,J.W. ; Bok,C.K. ; Vertommen,J. ; Rosenlund,R.
Pub. info.: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.419-428,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3049
2.

Conference Proceedings
Conference Proceedings
2. Top-surface imaging and optical proximity correction:a way to 0.18-ｦﾌm lithography at 248 nm
Goethals,A.M. ; Vertommen,J. ; Roey,F.Van ; Yen,A. ; Tritchkov,A. ; Ronse,K. ; Jonckheere,R. ; hove,L.Van den
Pub. info.: Optical Microlithography IX.  Part1  pp.362-374,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726