1.

Conference Proceedings
Conference Proceedings
1. Extension of graybeam writing for the 130-nm technology node
Chabala,J.M. ; Abboud,F.E. ; Sauer,C.A. ; Weaver,S. ; Lu,M. ; Pearce-Percy,H.T. ; Hofmann,U. ; Vernon,M. ; Ton,D. ; Cole,D.M. ; Naber,R.J.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part1  pp.36-48,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
2.

Conference Proceedings
Conference Proceedings
2. Advanced electron-beam pattern generation technology for 180-nm masks
Abboud,F.E. ; Sauer,C.A. ; Wang,W. ; Vernon,M. ; Prior,R. ; Pearce-Percy,H.T. ; Cole,D.M. ; Mankos,M.
Pub. info.: 17th Annual BACUS Symposium on Photomask Technology and Management.  pp.19-27,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3236
3.

Conference Proceedings
Conference Proceedings
3. Further advances in electron-beam pattern generation technology for 180-nm masks
Abboud,F.E. ; Sauer,C.A. ; Vernon,M. ; Coleman,T.P. ; Dean,R.L. ; Wang,W. ; Prior,R. ; Lu,M. ; Weaver,S.
Pub. info.: Photomask and X-Ray Mask Technology V.  pp.20-32,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3412