1.

Conference Proceedings
Conference Proceedings
1. Advancements in focused ion-beam repair of MoSiON phase-shifting masks
Lessing, J. ; Ferranti, D. C. ; Sundaram, G. ; Nagal, L. ; Verbeek, M.
Pub. info.: Photomask and X-Ray Mask Technology VI.  pp.609-622,  1999.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3748
2.

Conference Proceedings
Conference Proceedings
2. Fourier analysis of AIMS images for mask characterization
Koehle, R. ; Dettmann, W. ; Verbeek, M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.545-554,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
3.

Conference Proceedings
Conference Proceedings
3. Influence of 157-nm specific cleaning procedures on the quality of FIB repair depositions on reticles
Eisner, K. ; Schilz, C.M. ; Williams, A. ; Hien, S. ; Verbeek, M.
Pub. info.: Optical Microlithography XV.  Part One  pp.552-560,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
4.

Conference Proceedings
Conference Proceedings
4. Qualification of alternating PSM: defect inspection analysis in comparison to wafer printing results
Dettmann, W. ; Heumann, J.P. ; Hagner, T. ; Koehle, R. ; Rahn, S. ; Verbeek, M. ; Zarrabian, M. ; Weckesser, J. ; Hennig, M. ; Morgana, N.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.415-422,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
5.

Conference Proceedings
Conference Proceedings
5. High-precision mask repair using nanomachining
Verbeek, M. ; White, R. ; Klos, M.
Pub. info.: 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.210-217,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4764
6.

Conference Proceedings
Conference Proceedings
6. Alternating phase-shifting masks: phase determination and impact of quartz defects- theoretical and experimental results
Griesinger, U.A. ; Dettmann, W. ; Hennig, M. ; Heumann, J.P. ; Koehle, R. ; Ludwig, R. ; Verbeek, M. ; Zarrabian, M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.410-421,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754