1.

Conference Proceedings
Conference Proceedings
1. 28 Self-aligned PtSi Fully Silicided (FUST) Metal Gates for 45 nm CMOS Applications
van Dal, M.J.H. ; Lauwers, A. ; Cunniffe, J. ; Verbeeck, R. ; Vrancken, C. ; Demeurisse, C. ; Dao, T. ; Tamminga, Y. ; Veloso, A. ; Kittl, J.A. ; Maex, K.
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.233-240,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-05
2.

Conference Proceedings
Conference Proceedings
2. 27 Materials Issues of Ni Fully Silicided (FUSI) Gates for CMOS Applications
Kittl, J. A. ; Lauwers, A. ; Pawlak, M. A. ; Demeurisse, C. ; Anil, K. G. ; Veloso, A. ; van Dal, M. J. H. ; Schram, T. ; Brijs, B. ; Kaiser, M. ; Kubicek, S. ; Cunniffe, J. ; Verbeeck, R. ; Vrancken, C. ; Biesemans, S. ; Maex, K.
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.225-232,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-05
3.

Conference Proceedings
Conference Proceedings
3. 29 Influence of Activation Annealing and Silicidation Process on as Redistribution and Pile-up at the NixSiy/SiO2 Interface
Pawlak, M. ; Kittl, J. A. ; Janssens, T. ; Lauwers, A. ; Vandervorst, W. ; Anil, K. G. ; Schram, T. ; Veloso, A. ; van Dal, M.J. H. ; Maex, K. ; Vantomme, A.
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.241-248,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-05
4.

Conference Proceedings
Conference Proceedings
4. High-k Dielectrics Integration Prospects (Invited paper)
Kubicek, S. ; Van Elshocht, S. ; Delabie, A. ; Yamamoto, K. ; Beckx, S. ; Claes, M. ; Van Hoornick, N. ; Kwak, D.-H. ; Hyun, S. ; Rothschild, A. ; Veloso, A. ; Anil, K. ; Lujan, G. ; Kittle, J.A. ; Lauwers, A. ; Kaushik, V. ; Niwa, M. ; De Gendt, S. ; Heyns, M. ; Jurczak, M. ; Biesemans, S.
Pub. info.: ULSI Process Integration : proceedings of the International Symposium.  pp.169-192,  2005.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-06
5.

Conference Proceedings
Conference Proceedings
5. Spin-Valve Sensors with Mn1-xRhx Exchange Films
Veloso, A. ; Freitas, P. P. ; Fernandes, J. ; Ferreira, M.
Pub. info.: High-density magnetic recording and integrated magneto-optics, materials and devices : symposium held April 12-16, 1998, San Francisco, California, U.S..  pp.31-,  1998.  Warrendale, Penn.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 517
6.

Conference Proceedings
Conference Proceedings
6. Study of Pulsed RF DPN Process Parameters for 65 um node MOSFET Gate Dielectrics
Rothschild, A. ; Kraus, P.A. ; Chua, T.C. ; Nouri, F. ; Cubaynes, F.N. ; Veloso, A. ; Mertens, S. ; Date, L. ; Schreutelkamp, R. ; Schaekers, M.
Pub. info.: Integration of advanced micro- and nanoelectronic devices - critical issues and solutions : symposium held April 13-16, 2004, San Francisco, California, U.S.A..  pp.49-56,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 811
7.

Conference Proceedings
Conference Proceedings
7. Further Optimization of Plasma Nitridation of Ultra-thin Oxides for 65 nm 236 Node MOSFETs
Kraus, P.A. ; Chua, T.C. ; Rothschild, A. ; Cubaynes, F.N ; Veloso, A. ; Mertens, S. ; Date, L. ; Baue, T.M. ; Ahmed, K.Z. ; Campbell, J. ; Noun, F. ; Cruse, J. ; Schreutelkamp, R. ; Schaekers, M.
Pub. info.: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.236-243,  2004.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2004-01
8.

Conference Proceedings
Conference Proceedings
8. Plasma Nitridation Optimization for Sub-iSA Gate Dielectrics
Cubaynes, F.N. ; Schmitz, J. ; van der Marel, C. ; Snijders, J.H.M. ; Veloso, A. ; Rothschild, A. ; Olsen, C. ; Date, L.
Pub. info.: Silicon nitride and silicon dioxide thin insulating films VII : proceedings of the international symposium.  pp.595-604,  2003.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-2
9.

Technical Paper
Technical Paper
9. Development of a Model of the Muscle Skeletal System using Adams. Its Application to an Ergonomic Study in Automotive Industry.
Esteves, G. ; Ferreira, C. ; Veloso, A. ; Brandao, F.
Pub. info.: 2004 Digital Human Modeling for Design and Engineering Conference and Exposition : SAE technical paper.  2004.  Warrendale, Penn..  Society of Automotive Engineers
Title of ser.: Society of Automotive Engineers technical paper series
Ser. no.: 2004