1.

Conference Proceedings
Conference Proceedings
1. Acid-sensitive arylether-protected poly(4-hydroxystyrene) derivatives for chemically amplified deep-UV positive resists
Varanasi,P.R. ; Cornett,K.M. ; Katnani,A.D.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.512-523,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
2.

Conference Proceedings
Conference Proceedings
2. Dissolution/swelling behavior of cycloolefin polymers in aqueous base
Ito,H. ; Allen,R.D. ; Opitz,J. ; Wallow,T.I. ; Truong,H.D. ; Hofer,D.C. ; Varanasi,P.R. ; Jordhamo,G.M. ; Jayaraman,S. ; Vicari,R.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.2-12,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
3.

Conference Proceedings
Conference Proceedings
3. PHS with inert blocking groups for DUV negative resist
Brunsvold,W.R. ; Conley,W. ; Varanasi,P.R. ; Khojasteh,M. ; Patel,N.M. ; Molless,A.F. ; Neisser,M.O. ; Breyta,G.
Pub. info.: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.372-384,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3049
4.

Conference Proceedings
Conference Proceedings
4. Progress toward developing high-performance 193-nm single-layer positive resist based on functionalized poly(norbornenes)
Varanasi,P.R. ; Jordhamo,G.M. ; Lawson,M.C. ; Chen,K.-J. ; Brunsvold,W.R. ; Hughes,T. ; Keller,R. ; Khojasteh,M. ; Li,W. ; Allen,R.D. ; Ito,H. ; Opitz,J. ; Truong,H.D. ; Wallow,T.I.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part2  pp.1157-1162,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
5.

Conference Proceedings
Conference Proceedings
5. Effect of acid labile ether protecting groups on the oxide etch resistance and lithographic performance of 248-nm resists
Varanasi,P.R. ; Cornett,K.M. ; Lawson,M.C.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.322-327,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
6.

Conference Proceedings
Conference Proceedings
6. "193-nm single-layer resist materials: total consideration of design, physical properties, and lithographic performances on all major alicyclic platform chemistries"
Kajita,T. ; Nishimura,Y. ; Yamamoto,M. ; Ishii,H. ; Soyano,A. ; Kataoka,A. ; Slezak,M. ; Shimizu,M. ; Varanasi,P.R. ; Jordhamo,G. ; Lawson,M.C. ; Chen,R. ; Brunsvold,W.R. ; Li,W. ; Allen,R.D. ; Ito,H. ; Truong,H.D. ; Wallow,T.I.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.712-724,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345
7.

Conference Proceedings
Conference Proceedings
7. ArF resist for contact hole application
Chen,K.-J.R. ; Lawaon,M.C. ; Hughes,T. ; Brunsvld,W.R. ; Varanasi,P.R. ; Keller,R. ; Jordhamo,G.M.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.791-797,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345
8.

Conference Proceedings
Conference Proceedings
8. Postmodification as a way to improve the lithographic performance of resist materials
Li,W. ; Varanasi,P.R. ; Lawson,M.C. ; Hughes,T. ; Jordhamo,G.M. ; Allen,R.D. ; Ito,H.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.784-790,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345
9.

Conference Proceedings
Conference Proceedings
9. "IBM 193-nm bilayer resist: materials, lithographic performance, and optimization"
Kwong,R.W. ; Varanasi,P.R. ; Lawson,M.C. ; Hughes,T. ; Jordhamo,G.M. ; Khojasteh,M. ; Mahorowala,A.P. ; Sooriyakumaran,R. ; Brock,P.J. ; Larson,C.E. ; Fenzel-Alexander,D. ; Truong,H.D. ; Allen,R.D.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.50-57,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345