1.

Conference Proceedings
Conference Proceedings
1. Characterization. of imaging performance for immersion lithography at NA=0.93 [6154-05]
Gil, D. ; Tirapu-Azpiroz, J. ; Dexchner, R. ; Brunner, T. ; Fonseca, C. ; Fullam, J. ; Corliss, D. ; Ausschnitt, C. P. ; Vanoppen, P.
Pub. info.: Optical Microlithography XIX.  pp.615405-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
2.

Conference Proceedings
Conference Proceedings
2. Total test repeatability: a new figure of merit for CD metrology tools
Cramer, H. ; Kiers, T. ; Vanoppen, P. ; Meessen, J. ; Blok, F. ; Dusa, M.V.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.1254-1264,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
3.

Conference Proceedings
Conference Proceedings
3. CD uniformity improvement by active scanner corrections
van Schoot, J.B. ; Noordman, O. ; Vanoppen, P. ; Blok, F. ; Yim, D. ; Park, C.-H. ; Cho, B.-H. ; Theeuwes, T. ; Min, Y.-H.
Pub. info.: Optical Microlithography XV.  Part One  pp.304-314,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691