1.

Conference Proceedings
Conference Proceedings
1. Enabling the 45nm node by hyper-NA polarized lithography [6154-11]
De Boeij, W. ; Swinkels, G ; Le Masson, N. ; Koolen, A. ; Van Greevembroek, H. ; Klaassen, M. ; Van de Kerkhof, M. ; Van Ingen Schenau, K. ; De Winter, L. ; Wehrens, M. ; Hansen, S. ; Wagner, C.
Pub. info.: Optical Microlithography XIX.  pp.61540B-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
2.

Conference Proceedings
Conference Proceedings
2. Immersion lithography with an ultrahigh-NA in-line catadioptric lens and a high-transmission flexible polarization illumination system [6154-69]
Jasper, H. ; Modderman, T. ; Van de Kerkhof, M. ; Wagner, C. ; Mulkens, J. ; De. Bodij, W. ; Van Seten, E ; Kneer, B.
Pub. info.: Optical Microlithography XIX.  pp.61541W-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154