1.

Conference Proceedings
Conference Proceedings
1. Testing of optical materials for 193-nm applications
Liberman, V. ; Rothschild, M. ; Sedlacek, J.H.C. ; Uttaro, R.S. ; Grenville, A. ; Bates, A.K. ; Van Peski, C.
Pub. info.: Optical systems contamination and degradation : 20-23 July 1998, San Diego, California.  pp.411-418,  1998.  Bellingham, Wash., USA.  SPIE
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3427
2.

Conference Proceedings
Conference Proceedings
2. High-index optical materials for 193-nm immersion Iithogrqphy [6154-45]
Burnett, J. H. ; Kaplan, S. G. ; Shirley, E. L. ; Horowitz, D. ; Clauss, W. ; Grenville, A. ; Van Peski, C.
Pub. info.: Optical Microlithography XIX.  pp.615418-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
3.

Conference Proceedings
Conference Proceedings
3. Measurement of hard pellicles for 157-nm lithography using Fourier transform phase-shifting interferometry
Deck, L.L. ; Van Peski, C. ; Eandi, R.D.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.555-562,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
4.

Conference Proceedings
Conference Proceedings
4. Modeling and experimental investigation of bubble entrainment for flow over topography during immersion lithography
Burnett, H. B. ; Wei, A. C. ; El-Morsi, M. S. ; Shedd, T. A. ; Nellis, G. F. ; Spike, B. T. ; Van Peski, C. ; Grenville, A. ; Engelstad, R. L.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.829-840,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
5.

Conference Proceedings
Conference Proceedings
5. Initial assessment of the lithographic impact of the use of hard pellicles: an overview
De Bisschop, P. ; Kocsis, M.K. ; Bruls, R. ; Grenville, A. ; Van Peski, C.
Pub. info.: Optical Microlithography XVII.  pp.116-123,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
6.

Conference Proceedings
Conference Proceedings
6. Initial assessment of the lithographic impact of the use of a hard pellicle on wafer distortion
Kocsis, M.K. ; De Bisschop, P. ; Bruls, R. ; Grenville, A. ; Van Peski, C.
Pub. info.: Optical Microlithography XVII.  pp.1679-1688,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377