1.

Conference Proceedings
Conference Proceedings
1. Through-pitch anf through-focus characterization of AAPSM for ArF immersion lithography [6281-53]
Konishi, T. ; Kojima, Y. ; Okuda, Y. ; Philipsen, V. ; Leunissen, A. H. L. ; Van Look, L.
Pub. info.: EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany.  pp.62810S-,  2006.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6281
2.

Conference Proceedings
Conference Proceedings
2. Printability study with polarisation capable AIMS fab 193i to study polarisation effects [6152-92]
Zibold, A. ; Stroessner, U. ; Ridley, A. ; Scherubl, T. ; Rosenkranz, N. ; Harnisch, W. ; Poortinga, E. ; Schmid, R. ; Bekaert, J. ; Philipsen, V. ; Van Look, L.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XX.  pp.61522F-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6152
3.

Conference Proceedings
Conference Proceedings
3. Image imbalance compensation in alternating phase-shift masks towards the 45-nm node through-pitch imaging [5992-65]
Van Look, L. ; Kasprowicz, B. ; Zibold, A. ; Degel, W. ; Vandenberghe, G.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59921S-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
4.

Conference Proceedings
Conference Proceedings
4. Early learning on hyper-NA lithography using two-beam immersion interference [6154-70]
Hendrickx, E. ; Op de Beeck, M. ; Gronheid, R. ; Versluijs, J. ; Van Look, L. ; Ercken, M. ; Vandenberghe, G.
Pub. info.: Optical Microlithography XIX.  pp.61541X-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
5.

Conference Proceedings
Conference Proceedings
5. Optical extensions towards the 45-nm node
Hendrickx, E. ; Monnoyer, P. ; Van Look, L. ; Vandenberghe, G.
Pub. info.: Optical Microlithography XVII.  pp.357-368,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377