1.

Conference Proceedings
Conference Proceedings
1. Evaluation of the 3D compositional heterogeneity effect on line-edge-roughness
S. Kang ; W. Wu ; V. M. Prabhu ; B. D. Vogt ; E. K. Lin ; K. Turnquest
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519
2.

Conference Proceedings
Conference Proceedings
2. Effect of photo-acid generator concentration and developer strength on the patterning capabilities of a model EUV photoresist
K. Choi ; V. M. Prabhu ; K. A. Lavery ; E. K. Lin ; W. Wu ; J. T. Woodward ; M. J. Leeson ; H. B. Cao ; M. Chandhok ; G. Thompson
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519
3.

Conference Proceedings
Conference Proceedings
3. Identifying materials limits of chemically amplified photoresists
W. Wu ; V. M. Prabhu ; E. K. Lin
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519
4.

Conference Proceedings
Conference Proceedings
4. The effect of EUV molecular gloss architecture on the bulk dispersion of a photo-acid generator
D. L. VanderHart ; A. De Silva ; N. Felix ; V. M. Prabhu ; C. K. Ober
Pub. info.: Advances in resist materials and processing technology XXV.  1  pp.69231M-1-69231M-15,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6923
5.

Conference Proceedings
Conference Proceedings
5. A comparison of the reaction-diffusion kinetics between model-EUV polymer and molecular-glass photoresists
S. Kang ; K. Lavery ; K.-W. Choi ; V. M. Prabhu ; W. Wu
Pub. info.: Advances in resist materials and processing technology XXV.  1  pp.692317-1-692317-12,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6923
6.

Conference Proceedings
Conference Proceedings
6. Direct measurement of the in-situ developed latent image: the residual swelling fraction
V. M. Prabhu ; B. D. Vogt ; S. Kang ; A. Rao ; E. K. Lin ; S. K. Satija ; K. Turnquest
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519
7.

Conference Proceedings
Conference Proceedings
7. FTIR measurements of compositional heterogeneities
S. Kang ; B. D. Vogt ; W. Wu ; V. M. Prabhu ; D. L. VanderHart ; A. Rao ; E. K. Lin ; K. Turnquest
Pub. info.: Advances in resist materials and processing technology XXIV.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6519
8.

Conference Proceedings
Conference Proceedings
8. Characterization of the latent image to developed image in model EUV photoresists
J. T. Woodward ; K.-W. Choi ; V. M. Prabhu ; S. Kang ; A. Lavery
Pub. info.: Advances in resist materials and processing technology XXV.  2  pp.69232B-1-69232B-12,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6923