1.

Conference Proceedings
Conference Proceedings
1. (3.1) 3:20 - 3:50 PM - Strained-Si/SiGe-on-Insulator CMOS Technology as a Platform of Device Performance Boosters (Invited)
Takagi, S. ; Mizuno, T. ; Tezuka, T ; Sugiyama, N. ; Numata, T. ; Usuda, K. ; Moriyama, Y. ; Nakaharai, S. ; Koga, J. ; Tanabe, A. ; Hirashita, N. ; Irisawa, T. ; Maeda, T.(MIRAI-AIST)
Pub. info.: SiGe: materials, processing, and devices : proceedings of the First international symposium.  pp.61-76,  2004.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2004-07
2.

Conference Proceedings
Conference Proceedings
2. High performance strained-SOl CMOSFETs
Takagi, S-I. ; Mizuno, T. ; Tezuka, T. ; Sugiyama, N ; Numata, T. ; Usuda, K. ; Monyama, Y. ; Nakaharai, S. ; Koga, J. ; Tanabe, A. ; Maeda, T.
Pub. info.: Silicon-on-insulator technology and devices XI : proceedings of the international symposium.  pp.159-174,  2003.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-5
3.

Conference Proceedings
Conference Proceedings
3. High Performance Strained-SOI CMOSFETs*
Takagi, S.-I. ; Mizuno, T. ; Tezuka, T. ; Sugiyania, N. ; Numata, T. ; Usuda, K. ; Moriyama, Y. ; Nakaharai, S. ; Koga, J. ; Tanabe, A. ; Macda, T.
Pub. info.: ULSI Process Integration : proceedings of the International Symposium.  pp.518-533,  2003.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-6
4.

Conference Proceedings
Conference Proceedings
4. SIMULATION OF TEMPERATURE DISTRIBUTIONS DURING FAST THERMAL PROCESSING
Schrems, M. ; Yamamoto, A. ; Mikata, Y. ; Usuda, K. ; Nakao, K.
Pub. info.: Proceedings of the Seventh International Symposium on Silicon Materials Science and Technology.  pp.1050-1064,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-10
5.

Conference Proceedings
Conference Proceedings
5. Development of next-generation mask inspection method by using the feature of mask image captured with 199-nm inspection optics [6349-138]
Tsuji, Y. ; Kikuiri, N. ; Murakami, S. ; Takahara, K. ; Isomura, I. ; Tamura, Y. ; Yamashita, K. ; Hirano, R. ; Tateno, M. ; Matsumura, K. ; Takayama, N. ; Usuda, K.
Pub. info.: Photomask Technology 2006.  pp.63493M-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
6.

Conference Proceedings
Conference Proceedings
6. Development of advanced reticle inspection apparatus for hp 65 nm node device and beyond (Invited Paper) [6283-130]
Kikuiri, N. ; Murakami, S. ; Tsuchiya, H. ; Tateno, M. ; Takahara, K. ; Imai, S. ; Hirano, R. ; Isomura, I. ; Tsuji, Y. ; Tamura, Y. ; Matsumura, K. ; Usuda, K. ; Otaki, M. ; Suga, O. ; Ohira, K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62830Y-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283