1.

Conference Proceedings
Conference Proceedings
1. Improvement of ZEN 4100
Mitao,N. ; Abe,N. ; Kawata,A. ; Tanaka,K. ; Yamamoto,Y. ; Minagawa,T. ; Uraguchi,M. ; Ogawa,M.
Pub. info.: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.53-60,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3096
2.

Conference Proceedings
Conference Proceedings
2. Fine-pattern process with negative tone resist
Hoshino,E. ; Uraguchi,M. ; Yamamoto,Y. ; Sato,Y. ; Minagawa,K. ; Suzuki,K. ; Watanabe,K.
Pub. info.: Photomask and X-Ray Mask Technology V.  pp.214-219,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3412