Pollentier, I. ; Cheng, S.Y. ; Baudemprez, B. ; Laidler, D. ; van Dommelen, Y. ; Carpaij, R. ; Yu, J. ; Uchida, J. ; Viswanathan, A. ; Chin, D. ; Barry, K. ; Jakatdar, N.
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Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA. pp.105-115, 2004. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Yu, J. ; Viswanathan, A. ; Miyagi, M. ; Uchida, J. ; Lane, L. ; Barry, K.A. ; Kajitani, M. ; Kikuchi, T. ; Chan, K.C. ; Stanke, F.E.
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Metrology, Inspection, and Process Control for Microlithography XVIII. pp.839-848, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Yu, J. ; Uchida, J. ; van Dommelen, Y. ; Carpaij, R. ; Cheng, S. ; Pollentier, I. ; Viswanathan, A. ; Lane, L. ; Barry, K.A. ; Jakatdar, N.
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Metrology, Inspection, and Process Control for Microlithography XVIII. pp.1059-1068, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering