1.

Conference Proceedings
Conference Proceedings
1. E-beam direct write alignment strategies for the next generation node
H. Alves ; P. Hohmann ; K.-H. Kliem ; U. Weidenmueller ; S. Jahr
Pub. info.: Emerging lithographic technologies XII.  1  pp.69210I-1-69210I-12,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6921
2.

Conference Proceedings
Conference Proceedings
2. New alignment marks for improved measurement maturity
U. Weidenmueller ; H. Alves ; B. Schnabel ; B. Icard ; L. Pain
Pub. info.: EMLC 2008 : 24th European Mask and Lithography Conference : 21-24 January 2008, Dresden, Germany.  pp.679211-1-679211-7,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6792