1.

Conference Proceedings
Conference Proceedings
1. Comparison between 2-phase-shifting mask and 3-phase-shifting mask on application of printing low-duty-ratio contact array patterning
Hung,K.-C. ; Lin,B.S.-M. ; Chang,H.-A. ; Tseng,A. ; Chung,L.-S. ; Liu,W.-J. ; Wu,D.-Y. ; Huang,P.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1371-1378,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
2.

Conference Proceedings
Conference Proceedings
2. RuMBa: a rule-model OPC for low MEEF 130-nm KrF lithography
Hsu,S. ; Shi,X. ; Hsu,M. ; Corcoran,N.P. ; Chen,J.F. ; Desai,S. ; Sherrill,M.J. ; Tseng,Y.C. ; Chang,H.A. ; Kao,J.F. ; Tseng,A. ; Liu,W.J. ; Chen,A. ; Lin,A. ; Kujten,J.P. ; Jacobs,E. ; Verhappen,A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.172-185,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
3.

Conference Proceedings
Conference Proceedings
3. Lihtography process optimization for 130-nm polygate mask and the impact of mask error factor
Hsu,S. ; Shi,X. ; Socha,R.J. ; Chen,J.F. ; Yee,J.C. ; Anath,M. ; Desai,S. ; Imamura,P.H. ; Sherrill,M.J. ; Tseng,Y.C. ; Chang,H.A. ; Kao,J.F. ; Tseng,A. ; Liu,W.J. ; Hsu,S. ; Lin,A. ; Kujten,J.P. ; Jacobs,E. ; Verhappen,A.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.783-796,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344