1.

Conference Proceedings
Conference Proceedings
1. The study of phase angle effects to wafer process window using 193-nm EAPSM in a 300-mm wafer manufacturing environment
Chou, W.Y. ; Yen, S.M. ; Wu, J.K. ; Shieh, W.B. ; Chuang, M. ; Fan, G. ; Tseng, C.C. ; Hughes, G.P. ; MacDonald, S.S. ; Holiday, C. ; Chen, G.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.615-623,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
2.

Conference Proceedings
Conference Proceedings
2. Characterization of repairs to KrF 300-mm wafer printability for 0.13-pm design rule with attenuated phase-shifting mask
Chou, W. ; Chen, T. ; Tseng, W. ; Huang, P. ; Tseng, C.C. ; Chung, M. ; Wang, D. ; Huang, N.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.498-508,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889