1.

Conference Proceedings
Conference Proceedings
1. Developing a method to determine linewidth based on counting the atom spacings across a line
Silver,R.M. ; Jensen,C.P. ; Tsai,V.W. ; Fu,J. ; Villarrubia,J.S. ; Teague,E.C.
Pub. info.: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.441-460,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3332
2.

Conference Proceedings
Conference Proceedings
2. Measurement of pitch and width samples with the NIST calibrated atomic force microscope
Dixson,R. ; Koning,R. ; Vorburger,T.V. ; Fu,J. ; Tsai,V.W.
Pub. info.: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.420-432,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3332
3.

Conference Proceedings
Conference Proceedings
3. Step-height metrology for data storage applications
Kdning,R. ; Dixson,R.C. ; Fu,J. ; Renegar,B.T. ; Vorburger,T.V. ; Tsai,V.W. ; Postek,M.T.,Jr.
Pub. info.: Recent advances in metrology, characterization, and standards for optical digital data disks : 21-22 July 1999, Denver, Colorado.  pp.21-29,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3806
4.

Conference Proceedings
Conference Proceedings
4. Measurement of a CD and sidewall angle artifact with two-dimensional CD AFM metrology
Dixson,R. ; Sullivan,N.T. ; Schneir,J. ; McWaid,T.H. ; Tsai,V.W. ; Prochazka,J.J. ; Young,M.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography X.  pp.572-588,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2725
5.

Conference Proceedings
Conference Proceedings
5. Toward accurate linewidth metrology using atomic force microscopy and tip characterization
Dixson,R. ; Schneir,J. ; McWaid,T.H. ; Sullivan,N.T. ; Tsai,V.W. ; Zaidi,S.H. ; Brueck,S.R.J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography X.  pp.589-607,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2725