1.

Conference Proceedings
Conference Proceedings
1. Status of 300 mm SOI material: comparisons with 200 mm
Hovel, H. ; Alnionte, M. ; Tsai, P. ; Lee, J.D. ; Maurer, S. ; Kleinhenz, R. ; Schepis, D. ; Murphy, R. ; Ronsheim, P. ; Domemcucci, A. ; Rettinger, J. ; Sadana, D.
Pub. info.: Silicon-on-insulator technology and devices XI : proceedings of the international symposium.  pp.75-80,  2003.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-5
2.

Conference Proceedings
Conference Proceedings
2. Minimization of the Profile Microloading in Polysilicon Etching
Lum, R. ; Tsai, P. ; Furr, M. ; Bucknall, R.E. ; Wiltse, M. ; Hills, G.W.
Pub. info.: Proceedings of the tenth symposium on plasma processing.  pp.254-263,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-20
3.

Conference Proceedings
Conference Proceedings
3. Etching Molybdenum Silicide Using SF6/HBr/O2
Tsai, P. ; Cheung, E.
Pub. info.: Proceedings of the tenth symposium on plasma processing.  pp.460-468,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-20
4.

Conference Proceedings
Conference Proceedings
4. The Development and Performance of an Electrostatic Chuck for Silicon Etches
Su, J. ; Hills, G.W. ; Tsai, P.
Pub. info.: Proceedings of the tenth symposium on plasma processing.  pp.291-299,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-20