1.

Conference Proceedings
Conference Proceedings
1. Technology acceleration: the change in industry requirements
Trybula, W.J.
Pub. info.: Cost and performance in integrated circuit creation : 27-28 February 2003, Santa Clara, California, USA.  pp.27-33,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5043
2.

Conference Proceedings
Conference Proceedings
2. Technology acceleration: the suppliers' challenge
Trybula, W.J.
Pub. info.: Cost and performance in integrated circuit creation : 27-28 February 2003, Santa Clara, California, USA.  pp.34-40,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5043
3.

Conference Proceedings
Conference Proceedings
3. Does technology acceleration equate to mask cost acceleration? (Invited Paper)
Trybula, W.J. ; Grenon, B.J.
Pub. info.: Cost and performance in integrated circuit creation : 27-28 February 2003, Santa Clara, California, USA.  pp.93-99,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5043
4.

Conference Proceedings
Conference Proceedings
4. 157-nm lithography program at International SEMATECH (Invited Paper)
Dao, G.T. ; Yen, A. ; Trybula, W.J.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.26-32,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
5.

Conference Proceedings
Conference Proceedings
5. A common base for mask cost of ownership
Trybula, W.J.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.318-323,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
6.

Conference Proceedings
Conference Proceedings
6. Challenges of image placement and overlay at the 90-nm and 65-nm nodes
Trybula, W.J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.286-292,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038