1.

Conference Proceedings
Conference Proceedings
1. Dissolution/swelling behavior of cycloolefin polymers in aqueous base
Ito,H. ; Allen,R.D. ; Opitz,J. ; Wallow,T.I. ; Truong,H.D. ; Hofer,D.C. ; Varanasi,P.R. ; Jordhamo,G.M. ; Jayaraman,S. ; Vicari,R.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.2-12,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
2.

Conference Proceedings
Conference Proceedings
2. Progress toward developing high-performance 193-nm single-layer positive resist based on functionalized poly(norbornenes)
Varanasi,P.R. ; Jordhamo,G.M. ; Lawson,M.C. ; Chen,K.-J. ; Brunsvold,W.R. ; Hughes,T. ; Keller,R. ; Khojasteh,M. ; Li,W. ; Allen,R.D. ; Ito,H. ; Opitz,J. ; Truong,H.D. ; Wallow,T.I.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part2  pp.1157-1162,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
3.

Conference Proceedings
Conference Proceedings
3. "193-nm single-layer resist materials: total consideration of design, physical properties, and lithographic performances on all major alicyclic platform chemistries"
Kajita,T. ; Nishimura,Y. ; Yamamoto,M. ; Ishii,H. ; Soyano,A. ; Kataoka,A. ; Slezak,M. ; Shimizu,M. ; Varanasi,P.R. ; Jordhamo,G. ; Lawson,M.C. ; Chen,R. ; Brunsvold,W.R. ; Li,W. ; Allen,R.D. ; Ito,H. ; Truong,H.D. ; Wallow,T.I.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.712-724,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345
4.

Conference Proceedings
Conference Proceedings
4. Polymer design for 157-nm chemically amplified resists
Ito,H. ; Wallraff,G.M. ; Brock,P.J. ; Fender,N. ; Truong,H.D. ; Breyta,G. ; Miller,D.C. ; Sherwood,M.H. ; Allen,R.D.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.273-284,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345
5.

Conference Proceedings
Conference Proceedings
5. "IBM 193-nm bilayer resist: materials, lithographic performance, and optimization"
Kwong,R.W. ; Varanasi,P.R. ; Lawson,M.C. ; Hughes,T. ; Jordhamo,G.M. ; Khojasteh,M. ; Mahorowala,A.P. ; Sooriyakumaran,R. ; Brock,P.J. ; Larson,C.E. ; Fenzel-Alexander,D. ; Truong,H.D. ; Allen,R.D.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.50-57,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345
6.

Conference Proceedings
Conference Proceedings
6. Characterization of new aromatic polymers for 157-nm photoresist applications
Fender,N. ; Brock,P.J. ; Chau,W. ; Bangsaruntip,S. ; Mahorowala,A.P. ; Wallraff,G.M. ; Hinsberg,W.D. ; Larson,C.E. ; Ito,H. ; Breyta,G. ; Burnham,K. ; Truong,H.D. ; Lawson,P. ; Allen,R.D.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.417-427,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345