1.

Conference Proceedings
Conference Proceedings
1. Understanding the parameters for strong phase-shift mask lithography
Tritchkov,A.V. ; Stirniman,J.P. ; Mayhew,J.P. ; Rieger,M.L.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1336-1346,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
2.

Conference Proceedings
Conference Proceedings
2. Dual-mask model-based proximity correction for high-performance 0.10-μm CMOS process
Palmer,S.R. ; Mason,M.E. ; Randall,J.N. ; Aton,T. ; Kim,K. ; Tritchkov,A.V. ; Burdorf,J. ; Rieger,M.L. ; Stirniman,J.P.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.921-932,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186