1.

Conference Proceedings
Conference Proceedings
1. Toward a unified advanced CD-SEM specification for sub-0.18-ｦﾌm technology
Allgair,J. ; Archie,C.N. ; Banke,W. ; Bogardus,H. ; Griffith,J.E. ; Marchman,H.M. ; Postek,M.T. ; Saraf,L.H. ; Schlesinger,J.E. ; Singh,B. ; Sullivan,N.T. ; Trimble,L.E. ; Vladar,A.E. ; Yanof,A.W.
Pub. info.: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.138-150,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3332
2.

Conference Proceedings
Conference Proceedings
2. High-density lithography using attenuated phase-shift mask and negative resist
Pau,S. ; Cirelli,R.A. ; Bolan,K.J. ; Timko,A.G. ; Frackoviak,J. ; Watson,G.P. ; Trimble,L.E. ; Blatchford,J.W. ; Nalamasu,O.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.266-270,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
3.

Conference Proceedings
Conference Proceedings
3. New variable-transmission illumination technique optimized with design rule criteria
Cirelli,R.A. ; Mkrtchyan,M.M. ; Watson,G.P. ; Trimble,L.E. ; Weber,G.R. ; Windt,D.L. ; Nalamasu,O.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.395-405,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
4.

Conference Proceedings
Conference Proceedings
4. Lithography tricks and tribulations
Garofalo,J.G. ; Watson,G.P. ; Trimble,L.E. ; Cirelli,R.A. ; Colina,A. ; Grodnensky,I.M. ; Herrero,B. ; Kunbar,A. ; Peiffer,F.R. ; Takahashi,R. ; Trascon-Auriol,R.G. ; Yarbrough,W.J. ; Zych,L.J.
Pub. info.: 16th Annual BACUS Symposium on Photomask Technology and Management.  pp.311-322,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2884