1.

Conference Proceedings
Conference Proceedings
1. Methacrylate resists and antireflective coatings for 193-nm lithography
Taylor, G. N. ; Trefonas, P. ; Szmanda, C. R. ; Barclay, G. G. ; Kavanagh, R. J. ; Blacksmith, R. F. ; Joesten, L. A. ; Monaghan, M. J. ; Coley, S. ; Mao, Z. ; Cameron, J. F. ; Hardy, R. ; Gronbeck, D. ; Connolly, S.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.174-185,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
2.

Conference Proceedings
Conference Proceedings
2. Simple method for measuring acid generation quantum efficiency at 193nm
Szmanda, C. R. ; Kavanagh, R. J. ; Bohland, J. R. ; Cameron, J. F. ; Trefonas, P. ; Blacksmith, R. F.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.857-866,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
3.

Conference Proceedings
Conference Proceedings
3. Organic antireflective coatings for 193-nm lithography
Trefonas, P. ; Blacksmith, R. F. ; Szmanda, C. R. ; Kavanagh, R. J. ; Adams, T. G. ; Taylor, G. N. ; Coley, S. ; Pohlers, G.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.702-712,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
4.

Conference Proceedings
Conference Proceedings
4. Evaluation of a novel photoacid generator for chemically amplified photoresist with ArF exposure
Kohler, T. ; Brainard, R. L. ; Naulleau, P. P. ; Steenwinckel, D. Van ; Lammers, J. H. ; Goldberg, K. A. ; Mackevich, J. F. ; Trefonas, P.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.140-148,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
5.

Conference Proceedings
Conference Proceedings
5. Shot noise, LER, and quantum efficiency of EUV photoresists
Brainard, R.L. ; Trefonas, P. ; Lammers, J.H. ; Cutler, C.A. ; Mackevich, J.F. ; Trefonas, A. ; Robertson, S.A.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.74-85,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374