1.

Conference Proceedings
Conference Proceedings
1. 30 Study of Stress Evolution during Full Silicidation for Gate Stacks
Torregiani, C. ; Kittl, J. A. ; Capponi, S. ; Vanhoyland, G. ; Brongersma, S. ; Lauwers, A. ; Van Houtte, P. ; Maex, K.
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.249-256,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-05
2.

Conference Proceedings
Conference Proceedings
2. Thermomechanical Properties of Nickel Silicide: Dependence on the Microstructure
Torregiani, C. ; D'Haen, J. ; Opsomer, K. ; Dal, M. J. Van ; Houtte, P. Van ; Maex, K.
Pub. info.: Textures of materials : ICOTOM 14 : Proceedings of the 14th International Conference on Textures of Materials, held in Leuven, Belgium, July 11-15, 2005.  pp.1431-1436,  2005.  Uetikon-Zuerich, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 495-497(2)
3.

Conference Proceedings
Conference Proceedings
3. A Comparison Of Spike, Flash, SPER and Laser Annealing For 45nm CMOS
Lindsay, R. ; Pawlak, B. ; Kittl, J. ; Henson, K. ; Torregiani, C. ; Giangrandi, S. ; Surdeanu, R. ; Vandervorst, W. ; Mayur, A. ; Ross, J. ; McCoy, S. ; Gelpey, J. ; Elliott, K. ; Pages, X. ; Satta, A. ; Lauwers, A. ; Stolk, P. ; Maex, K.
Pub. info.: CMOS front-end materials and process technology : symposium held April 22-24, 2003, San Francisco, California, U.S.A..  pp.261-266,  2003.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 765