1.

Conference Proceedings
Conference Proceedings
1. WAFERS WITH LOW LPD AND REDUCED HAZE PREPARED BY SHORT ANNEALING PROCESS
Vasat, J.L. ; Stefanescu, A.D. ; Torack, T. ; Orizio, R.
Pub. info.: Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology.  pp.254-272,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-2
2.

Conference Proceedings
Conference Proceedings
2. Oxide and Hot Carrier Reliability Studies for Strained Si-on Relaxed SiGe MOS Devices
Joshi, S. ; Ahmad, D. ; Palard, M. ; Kelly, D. ; Onsongo, D. ; Dey, S. ; Fei, L. ; Torack, T. ; Seacrist, M. ; Kellerman, B. ; Banerjee, S.K.
Pub. info.: Silicon nitride, silicon dioxide thin insulating films, and other emerging dieletrics VIII : proceedings of the international symposium.  pp.353-362,  2005.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-01
3.

Conference Proceedings
Conference Proceedings
3. 64 Si:C Epitaxial Wafer for Improved Sub-100nm CMOS Transistor Performance
Standley, R. ; Mansoori, M. ; Miles, D. ; Chakravarthi, S. ; Seacrist, M. ; Wise, R. ; Torack, T. ; Ries, M.
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.535-541,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-05
4.

Conference Proceedings
Conference Proceedings
4. WAFERS WITH LOW LPD AND REDUCED HAZE PREPARED BY SHORT ANNEALING PROCESS
Vasat, J.L. ; Stefanescu, A.D. ; Torack, T. ; Orizio, R.
Pub. info.: Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology.  pp.254-272,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-2