1.

Conference Proceedings
Conference Proceedings
1. Extension of graybeam writing for the 130-nm technology node
Chabala,J.M. ; Abboud,F.E. ; Sauer,C.A. ; Weaver,S. ; Lu,M. ; Pearce-Percy,H.T. ; Hofmann,U. ; Vernon,M. ; Ton,D. ; Cole,D.M. ; Naber,R.J.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part1  pp.36-48,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
2.

Conference Proceedings
Conference Proceedings
2. Lithography performance of contact holes:I.Optimization of Pattern fidelity using MPG and MPG-II
Weaver,S. ; Lu,M. ; Chabala,J.M. ; Ton,D. ; Sauer,C.A. ; MAck,C.A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.160-171,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066