1.

Conference Proceedings
Conference Proceedings
1. New die-to-database mask inspection system with i-line optics for 256-Mb and 1-Gb DRAMs
Tabata,M. ; Yamashita,K. ; Tsuchiya,H. ; Nomura,T. ; Inoue,H. ; Watanabe,T. ; Tojo,T. ; Yoshino,H.
Pub. info.: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.415-422,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3096
2.

Conference Proceedings
Conference Proceedings
2. New mask blank handling system for the advanced electron-beam writer
Yoshitake,S. ; Ooki,K. ; Hirano,R. ; Tojo,T. ; Ogawa,Y. ; Ogura,K. ; Yamamoto,T. ; Toriumi,M. ; Tada,Y.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.905-915,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
3.

Conference Proceedings
Conference Proceedings
3. Development of an in-situ cleaning system for an e-beam reticle writer
Ohtoshi,K. ; Yamasaki,S. ; Tamamushi,S. ; Tojo,T. ; Hirano,R. ; Fukudome,Y. ; Shimomura,N. ; Nishimura,S. ; Yoshitake,S. ; Ogasawara,M.
Pub. info.: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.68-71,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3096
4.

Conference Proceedings
Conference Proceedings
4. Improvement of beam-adjustment accuracy by beam-intensity distribution measurement on a second shaping aperture in electron-beam writing systems
Nishimura,S. ; Ogasawara,M. ; Tojo,T.
Pub. info.: Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA.  pp.684-691,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4343
5.

Conference Proceedings
Conference Proceedings
5. Stage tracking of a mask-scan EB mask writer test stand
Nishimura,S. ; Mitsui,S. ; Ogasawara,M. ; Akeno,K. ; Shimizu,M. ; Kusakabe,H. ; Wada,H. ; Hattori,K. ; Yoshitake,S. ; Simomura,N. ; Takamatsu,J. ; Sunaoshi,H. ; Fukudome,Y. ; Tojo,T. ; Tsuchiya,S.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.503-510,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
6.

Conference Proceedings
Conference Proceedings
6. Pattern shift error induced by coating and developing
Yoshitake,S. ; Matsuki,K. ; Hirano,R. ; Tojo,T.
Pub. info.: Photomask and X-Ray Mask Technology III.  pp.43-52,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2793